Electronic structure of wurtzite Ga0.75Al0.25N: a first principle calculation

被引:0
|
作者
Yang, Mingzhu [1 ]
Wang, Meishan [2 ]
机构
[1] Nanjing Univ Sci & Technol, Inst Elect Engn & Optoelect Technol, Nanjing 210094, Jiangsu, Peoples R China
[2] Ludong Univ, Sch Phys, Yantai 264025, Peoples R China
关键词
first principle; wurtzite Ga0.75Al0.25N; electronic structure; band structure;
D O I
10.4028/www.scientific.net/AHM.556-562.43
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In order to lay theoretical foundations for preparation of Ga0.75Al0.25N photocathodes, research on ternary LTI-V alloys Ga0.75Al0.25N are carried on. Using CASTEP software package based on density functional theory within a plane wave ultrasoft pseudo potential scheme, total energies, band structures, density of states, and charge distribution of three different structures of wurtzite Ga0.75Al0.25N are calculated. Results show that the structure in which Al atoms in para-positon of interlayer is most stable. Ga0.75Al0.25N is semiconductor with direct band gap. The threshold wavelength is 321.8nm which can satisfy the need of preparation of "solar blind" photocathodes.
引用
收藏
页码:43 / +
页数:2
相关论文
共 50 条
  • [21] Mechanical properties and electronic structure of TiC, Ti0.75W0.25C, Ti0.75W0.25C0.75N0.25, TiC0.75N0.25 and TiN
    Wang, Bin
    Liu, Ying
    Liu, Yan
    Ye, Jin-Wen
    PHYSICA B-CONDENSED MATTER, 2012, 407 (13) : 2542 - 2548
  • [22] AL0.25GA0.75AS IN0.25GA0.75AS PSEUDOMORPHIC MODFET WITH HIGH DC AND RF PERFORMANCE
    DICKMANN, J
    GEYER, A
    DAEMBKES, H
    NICKEL, H
    LOSCH, R
    SCHLAPP, W
    ELECTRONICS LETTERS, 1991, 27 (06) : 501 - 502
  • [23] First principles calculation of Ga-N codoped wurtzite ZnO
    Zhou, CJ
    Kang, JY
    SMIC-XIII: 2004 13TH INTERNATIONAL CONFERENCE ON SEMICONDUCTING & INSULATING MATERIALS, 2004, : 81 - 84
  • [24] Study of spin transport in In0.75Ga0.25As/In0.75Al0.25As narrow wires
    Kakegawa, T
    Akabori, M
    Yamada, S
    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, 2004, 5 (03) : 309 - 312
  • [25] Annealing studies of Si-implanted Al0.25Ga0.75N
    Ryu, MY
    Chitwood, EA
    Claunch, EN
    Yeo, YK
    Hengehold, RL
    Fellows, JA
    Steiner, T
    5TH INTERNATIONAL CONFERENCE ON NITRIDE SEMICONDUCTORS (ICNS-5), PROCEEDINGS, 2003, 0 (07): : 2593 - 2596
  • [26] Annealing studies of Si-implanted Al0.25Ga0.75N
    Yeo, Y.K. (Yung.Yeo@afit.edu), (Wiley-VCH Verlag):
  • [27] First-principle study on the electronic structure and optical property of new diluted magnetic semiconductor (Y0.75Sr0.25) (Cu0.75Mn0.25)SO
    Zhang, Li
    Chen, Haoze
    Feng, Shan
    Li, Linxian
    Li, Yuke
    Chen, Jianye
    AIP ADVANCES, 2017, 7 (11):
  • [28] First-principle calculation of the electronic structure and optical properties of ZnO and Al:ZnO
    Gonzalez, D. G.
    Palai, R.
    Velev, J. P.
    MRS COMMUNICATIONS, 2024, 14 (06) : 1388 - 1394
  • [29] Normally-off Al0.25Ga0.75N/GaN MOSHEMT with Stack Gate Dielectric Structure
    Swain, R.
    Lenka, T. R.
    PROCEEDINGS OF THE 2015 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC), 2015, : 567 - 570
  • [30] Al0.25Ga0.75N/GaN Schottky Barrier Photodetectors with an Al0.3Ga0.7N Intermediate Layer
    Lee, K. H.
    Chang, P. C.
    Chang, S. J.
    Su, Y. K.
    Wang, Y. C.
    Yu, C. L.
    Wu, S. L.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2009, 156 (07) : J199 - J202