Scaling constraints in nanoelectronic random-access memories

被引:73
|
作者
Amsinck, CJ [1 ]
Di Spigna, NH [1 ]
Nackashi, DP [1 ]
Franzon, PD [1 ]
机构
[1] N Carolina State Univ, Raleigh, NC 27695 USA
关键词
D O I
10.1088/0957-4484/16/10/047
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nanoelectronic molecular and magnetic tunnel junction (MTJ) MRAM crossbar memory systems have the potential to present significant area advantages (4 to 6F(2)) compared to CMOS-based systems. The scalability of these conductivity-switched RAM arrays is examined by establishing criteria for correct functionality based on the readout margin. Using a combined circuit theoretical modelling and simulation approach, the impact of both the device and interconnect architecture on the scalability of a conductivity-state memory system is quantified. This establishes criteria showing the conditions and on/off ratios for the large-scale integration of molecular devices, guiding molecular device design. With 10% readout margin on the resistive load, a memory device needs to have an on/off ratio of at least 7 to be integrated into a 64 x 64 array, while an on/off ratio of 43 is necessary to scale the memory to 512 x 512.
引用
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页码:2251 / 2260
页数:10
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