Low-energy (300 eV) versatile scanning electron microscope with 30 nm resolution

被引:7
|
作者
Zlatkin, A [1 ]
García, N [1 ]
机构
[1] CSIC, Lab Fis Sistemas Pequenos & Nanotecnol, Madrid 28006, Spain
关键词
electron optics; scanning electron microscope; lithography; microcolumn;
D O I
10.1016/S0167-9317(98)00260-3
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a new low-energy (similar to 300 eV) scanning electron microscope with 30 nm resolution. The instrument operates with a flat integrated chip lens which performs electron extraction, e-beam focusing and deflection. The important point is that the electron emitter is positioned 1-2 mm away from the input aperture, thus, their precise alignment is not necessary. The extension of the instrument to a multicolumn array of electron beams for multipattern writing is quite feasible. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:39 / 46
页数:8
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