Low-energy (300 eV) versatile scanning electron microscope with 30 nm resolution

被引：7

作者：

Zlatkin, A ^{[1
]}

García, N ^{[1
]}

机构：

[1] CSIC, Lab Fis Sistemas Pequenos & Nanotecnol, Madrid 28006, Spain

来源：

MICROELECTRONIC ENGINEERING | 1999年 / 45卷 / 01期

关键词：

electron optics; scanning electron microscope; lithography; microcolumn;

D O I：

10.1016/S0167-9317(98)00260-3

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present a new low-energy (similar to 300 eV) scanning electron microscope with 30 nm resolution. The instrument operates with a flat integrated chip lens which performs electron extraction, e-beam focusing and deflection. The important point is that the electron emitter is positioned 1-2 mm away from the input aperture, thus, their precise alignment is not necessary. The extension of the instrument to a multicolumn array of electron beams for multipattern writing is quite feasible. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：39 / 46

页数：8

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