Size Effects of Microstructure during Plasma Immersion Ion Implantation

被引：0

作者：

Gong, Chunzhi ^{[1
]}

Wang, Zhijian ^{[1
]}

Tian, Xiubo ^{[1
]}

Yang, Shiqin ^{[1
]}

机构：

[1] Harbin Inst Technol, Sch Mat Sci & Engn, State Key Lab Adv Welding Prod & Technol, Harbin 150001, Peoples R China

来源：

INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2 | 2010年

关键词：

NANOTRIBOLOGY; MEMS;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Plasma immersion ion implantation (PBII) has been regarded as an effective tool to enhance surface properties. The implantation dynamics during plasma ion implantation of small component used in micro-electromechanical systems (MEMS) has seldom been investigated. Numerical simulation of PBII by Particle-in-cell / Monte Carlo collision method has been launched to understand the effect of small target dimension. As the characteristic size of the component decreases, the electric field strength near the top surface increases and the thickness of plasma sheath also decreases with a higher impact energy. In summary the implantation efficiency increases significantly.

引用

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页码：1451 / 1452

页数：2

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