Behaviour of 4H-SiC pin diodes studied by numerical device simulation

被引:0
|
作者
Werber, D. [1 ]
Borthen, P. [1 ]
Wachutka, G. [1 ]
机构
[1] Tech Univ Munich, Inst Phys & Electrochem, Arcisstr 21, D-80290 Munich, Germany
来源
关键词
pin diodes; numerical simulation; high-temperature measurement;
D O I
10.4028/www.scientific.net/MSF.556-557.905
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We simulated and measured the forward characteristics of 4H-SiC pin diodes in a wide temperature range from 300K to 700K. Our simulations are based on the stationary drift-diffusion model including a model for incomplete ionization of the dopants. Physically based models for Auger recombination and Shockley-Read-Hall recombination are used as well. For the mobility model the empirical relation of Caughey-Thomas is used. The model parameters to be calibrated in the simulation are the electron and hole minority lifetimes and the electron and hole bulk mobilities. Employing temperature-dependent carrier lifetimes we achieved very good agreement between simulations and measured data. For the temperature- and doping-dependent carrier mobilities we found that the best fit is obtained for a bulk mobility value much smaller than that suggested by standard parameters for 4H-SiC. With the calibrated parameters we simulated the internal carrier distributions for temperatures up to 700 K and for different carrier lifetimes.
引用
收藏
页码:905 / +
页数:2
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