Thin film cryogenic thermometers defined with optical lithography for thermomagnetic measurements on films

被引:4
|
作者
Nelson, J. [1 ]
Goldman, A. M. [1 ]
机构
[1] Univ Minnesota, Sch Phys & Astron, Minneapolis, MN 55455 USA
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 2015年 / 86卷 / 05期
基金
美国国家科学基金会;
关键词
TEMPERATURE SENSORS;
D O I
10.1063/1.4919734
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Resistance thermometers are common secondary thermometers in cryogenic applications. Bulk RuO2 thermometers are used in dilution refrigerators because of their low magnetoresistances in addition to their temperature sensitivity. Thermoelectric and thermomagnetic measurements require multiple thermometers to measure temperature differences. Here, we present a method to fabricate thin film RuO2 thermometers directly onto an experimental substrate. This enhances thermal contact between thermometers and films whose thermoelectric or thermomagnetic properties may be measured. Commercial thermometers have higher temperature sensitivities than the thermometers presented in this study, but commercial thermometers must be carefully heat sunk to the cryostat or sample to be useful. Thin film thermometers can be patterned with ultraviolet (UV) lithography. This allows both the size of the thermometer and its distance from the sample, when also patterned with UV lithography, to be on the order of micrometers. A universal calibration curve for these thin film thermometers has not been produced. The efficacy of these thermometers has been demonstrated through measurements of the Nernst effect in Nb. In this study, the thin film thermometers were calibrated using the cryostat thermometers. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:5
相关论文
共 50 条
  • [21] Optical measurements of strain and stress in thin films
    Tamulevicius, S
    Augulis, L
    Laukaitis, G
    INTERNATIONAL CONFERENCE ON SOLID STATE CRYSTALS 2000: EPILAYERS AND HETEROSTRUCTURES IN OPTOELECTRONICS AND SEMICONDUCTOR TECHNOLOGY, 2001, 4413 : 242 - 247
  • [22] MECHANICAL MEASUREMENTS ON OPTICAL THIN-FILMS
    EMILIANI, G
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1989, 44 (245): : 87 - 88
  • [23] Extension of 248 nm optical lithography: a thin film imaging approach
    Lin, QH
    Katnani, A
    Brunner, T
    De Wan, C
    Fairchok, C
    La Tulipe, D
    Simons, J
    Petrillo, K
    Babich, K
    Seeger, D
    Angelopoulos, M
    Sooriyakumaran, R
    Wallraff, G
    Hofer, D
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2, 1998, 3333 : 278 - 288
  • [24] Stacking Lanthanide-MOF Thin Films to Yield Highly Sensitive Optical Thermometers
    Chen, Dong-Hui
    Haldar, Ritesh
    Woell, Christof
    ACS APPLIED MATERIALS & INTERFACES, 2023, 15 (15) : 19665 - 19671
  • [25] Characterizing optical constants of thin films for vacuum ultraviolet lithography applications
    Fan, W
    Chen, HL
    Wu, CL
    Chang-Liao, KS
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (6B): : 3684 - 3688
  • [26] Characterized optical constants of thin films for vacuum ultraviolet lithography applications
    Fan, W.
    Chen, H.L.
    Wu, C.L.
    Chang, L.K.S.
    Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, 2003, : 38 - 39
  • [28] Cryogenic optical profilometry for the calculation of coefficient of thermal expansion in thin films
    Brookshire, Kirsten L.
    Rafiei, Ramin
    Martyniuk, Mariusz
    Silva, K. K. M. B. Dilusha
    Bumgarner, John
    Basedow, Robert W.
    Liu, Yinong
    Faraone, Lorenzo
    MICRO/NANO MATERIALS, DEVICES, AND SYSTEMS, 2013, 8923
  • [29] LOSS MEASUREMENTS IN THIN-FILM OPTICAL WAVEGUIDES
    WEBER, HP
    DUNN, FA
    LEIBOLT, WN
    APPLIED OPTICS, 1973, 12 (04): : 755 - 757
  • [30] OPTICAL PROPERTIES OF INDIUM FROM THIN FILM MEASUREMENTS
    THEYE, ML
    DEVANT, G
    THIN SOLID FILMS, 1969, 4 (03) : 205 - &