Characterized optical constants of thin films for vacuum ultraviolet lithography applications

被引：0
|
作者：
Fan, W. [1 ]
Chen, H.L. [1 ]
Wu, C.L. [2 ]
Chang, L.K.S. [2 ]
机构：
[1] Nat. Nano Device Lab., 1001-1 Ta Hsueh Road, Hsinchu, Taiwan
[2] Institute of Engineering and System Science, National Tsing Hua University, Hsinchu, Taiwan
来源：
Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | 2003年
关键词：
Compendex;
D O I：
1268507
中图分类号：
学科分类号：
摘要：
Nanotechnology - Thin films - Optical films - Vacuum applications - Optical constants
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页码：38 / 39
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