Thin film cryogenic thermometers defined with optical lithography for thermomagnetic measurements on films

被引:4
|
作者
Nelson, J. [1 ]
Goldman, A. M. [1 ]
机构
[1] Univ Minnesota, Sch Phys & Astron, Minneapolis, MN 55455 USA
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 2015年 / 86卷 / 05期
基金
美国国家科学基金会;
关键词
TEMPERATURE SENSORS;
D O I
10.1063/1.4919734
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Resistance thermometers are common secondary thermometers in cryogenic applications. Bulk RuO2 thermometers are used in dilution refrigerators because of their low magnetoresistances in addition to their temperature sensitivity. Thermoelectric and thermomagnetic measurements require multiple thermometers to measure temperature differences. Here, we present a method to fabricate thin film RuO2 thermometers directly onto an experimental substrate. This enhances thermal contact between thermometers and films whose thermoelectric or thermomagnetic properties may be measured. Commercial thermometers have higher temperature sensitivities than the thermometers presented in this study, but commercial thermometers must be carefully heat sunk to the cryostat or sample to be useful. Thin film thermometers can be patterned with ultraviolet (UV) lithography. This allows both the size of the thermometer and its distance from the sample, when also patterned with UV lithography, to be on the order of micrometers. A universal calibration curve for these thin film thermometers has not been produced. The efficacy of these thermometers has been demonstrated through measurements of the Nernst effect in Nb. In this study, the thin film thermometers were calibrated using the cryostat thermometers. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:5
相关论文
共 50 条
  • [1] Calibration in cryogenic conditions of deposited thin-film thermometers on quartz crystal microbalances
    Scaccabarozzi, Diego
    Saggin, Bortolino
    Magni, Marianna
    Corti, Marco Giovanni
    Zampetti, Emiliano
    Palomba, Ernesto
    Longobardo, Andrea
    Dirri, Fabrizio
    SENSORS AND ACTUATORS A-PHYSICAL, 2021, 330
  • [2] Optical properties of thin film CrxNy-CrOxNy multilayer films for 157 nm optical lithography
    Rack, PD
    Lassiter, M
    Bourov, A
    Baiko, D
    Smith, B
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (02): : 814 - 817
  • [3] Cryogenic Microwave Wideband Measurements of Superconducting Thin Films
    Silva, Enrico
    Pompeo, Nicola
    Torokhtii, Kostiantyn
    Sarti, Stefano
    2015 IEEE INTERNATIONAL INSTRUMENTATION AND MEASUREMENT TECHNOLOGY CONFERENCE (I2MTC), 2015, : 358 - 363
  • [4] CALIBRATION OF THIN FILM RESISTANCE THERMOMETERS FOR HEAT FLUX MEASUREMENTS IN SHOCK TUBE
    SEGINER, A
    COHEN, A
    ROM, J
    ISRAEL JOURNAL OF TECHNOLOGY, 1965, 3 (01): : 25 - &
  • [5] PRECISION OPTICAL MEASUREMENTS ON THIN FILMS
    BENNETT, HE
    BENNETT, JM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (05): : 323 - &
  • [6] Photothermal measurements on optical thin films
    Welsch, E.
    Ristau, D.
    Applied Optics, 1995, 34 (31): : 7239 - 7253
  • [7] OPTICAL MEASUREMENTS IN THIN DIELECTRIC FILMS
    CLAPHAM, PB
    VACUUM, 1966, 16 (05) : 253 - &
  • [8] Optimization of Cryogenic Ge Detector Equipped with NbSi Thin Film Thermometers: Fiducial Volume and Energy Resolution
    Y. Dolgorouky
    S. Marnieros
    E. Olivieri
    L. Bergé
    M. Chapellier
    S. Collin
    L. Dumoulin
    A. Juillard
    F. Lalu
    C. Nones
    Journal of Low Temperature Physics, 2008, 151 : 877 - 883
  • [9] Optimization of cryogenic Ge detector equipped with NbSi thin film thermometers:: Fiducial volume and energy resolution
    Dolgorouky, Y.
    Marnieros, S.
    Olivieri, E.
    Berge, L.
    Chapellier, M.
    Collin, S.
    Dumoulin, L.
    Juillard, A.
    Lalu, F.
    Nones, C.
    JOURNAL OF LOW TEMPERATURE PHYSICS, 2008, 151 (3-4) : 877 - 883
  • [10] Optical and Mechanical Properties of Infrared Thin Film at Cryogenic Temperature
    Pradal, Fabien
    Lhuillier, Remi
    Mouricaud, Daniel
    OPTICAL SYSTEMS DESIGN 2015: ADVANCES IN OPTICAL THIN FILMS V, 2015, 9627