Design of SiC-Doped Piezoresistive Pressure Sensor for High-Temperature Applications

被引:17
|
作者
Wejrzanowski, Tomasz [1 ]
Tymicki, Emil [2 ,3 ]
Plocinski, Tomasz [1 ]
Bucki, Janusz Jozef [1 ]
Tan, Teck Leong [4 ]
机构
[1] Warsaw Univ Technol, Fac Mat Sci & Engn, Woloska 141, PL-02507 Warsaw, Poland
[2] Inst Microelect & Photon, Lukasiewicz Res Network, Al Lotnikow 32-46, PL-02668 Warsaw, Poland
[3] ENSEMBLE3 Sp Zoo, Wolczynska Str 133, PL-01919 Warsaw, Poland
[4] ASTAR, Inst High Performance Comp, 1 Fusionopolis Way,16-16 Connexis, Singapore 138632, Singapore
关键词
SiC; piezoresistive effect; high temperature pressure sensor; gauge factor; SINGLE-CRYSTALLINE; SILICON-CARBIDE; STRAIN SENSOR; MEMS; FABRICATION; DEPENDENCE; GROWTH; POLYCRYSTALLINE; SCATTERING; FILMS;
D O I
10.3390/s21186066
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Within these studies the piezoresistive effect was analyzed for 6H-SiC and 4H-SiC material doped with various elements: N, B, and Sc. Bulk SiC crystals with a specific concentration of dopants were fabricated by the Physical Vapor Transport (PVT) technique. For such materials, the structures and properties were analyzed using X-ray diffraction, SEM, and Hall measurements. The samples in the form of a beam were also prepared and strained (bent) to measure the resistance change (Gauge Factor). Based on the results obtained for bulk materials, piezoresistive thin films on 6H-SiC and 4H-SiC substrate were fabricated by Chemical Vapor Deposition (CVD). Such materials were shaped by Focus Ion Beam (FIB) into pressure sensors with a specific geometry. The characteristics of the sensors made from different materials under a range of pressures and temperatures were obtained and are presented herewith.
引用
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页数:16
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