SiC based pressure sensor for high-temperature environments

被引:0
|
作者
Wieczorek, Q. [1 ]
Schellin, B. [1 ]
Obermeier, E. [1 ]
Fagnani, G. [2 ]
Drera, L. [2 ]
机构
[1] Tech Univ Berlin, MAT, TIB 3-1,Gustav Meyer Allee 25, D-13355 Berlin, Germany
[2] Gefran SpA, I-25050 Provaglio Dlseo, Italy
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中图分类号
TP18 [人工智能理论];
学科分类号
081104 ; 0812 ; 0835 ; 1405 ;
摘要
Aim of the work presented herein is to develop a SiC based pressure sensor enabling measurements up to 3000 bar at temperatures in the range of 25 degrees C to 400 degrees C. For fabrication of the sensor chip various processing techniques potentially permitting effective membrane structuring are compared. The sensor chip features a centerboss membrane with four piezoresistors made from epitaxial layers. To limit movement of the centerboss, a bottom plate wafer made from SiC is bonded to the sensor chip. The bottom plate is thus acting as an overpressure safety feature. A tungsten-based metallization scheme tested up to 500 degrees C is used. The housing of the sensor is fluid-free and employs a steel membrane for media separation.
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页码:748 / 751
页数:4
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