Covalent Patterning of 2D MoS2

被引：8

作者：

Chen, Xin ^{[1
]}

Kohring, Malte ^{[2
]}

Assebban, M'hamed ^{[1
]}

Tywoniuk, Bartlomiej ^{[3
]}

Bartlam, Cian ^{[3
]}

Moses Badlyan, Narine ^{[2
]}

Maultzsch, Janina ^{[2
]}

Duesberg, Georg S. ^{[3
]}

Weber, Heiko B. ^{[2
]}

Knirsch, Kathrin C. ^{[1
]}

Hirsch, Andreas ^{[1
]}

机构：

[1] Friedrich Alexander Univ Erlangen Nurnberg FAU, Dept Chem & Pharm, Nikolaus Fiebiger Str 10, D-91058 Erlangen, Germany

[2] Friedrich Alexander Univ Erlangen Nurnberg FAU, Dept Phys, Staudtstr 7, D-91058 Erlangen, Germany

[3] Univ Bundeswehr, Fac Elect Engn & Informat Technol, Inst Phys, EIT 2, D-85579 Neubiberg, Germany

来源：

CHEMISTRY-A EUROPEAN JOURNAL | 2021年 / 27卷 / 52期

基金：

欧盟地平线“2020”;

关键词：

functionalization; MoS2; patterning; PL; Raman spectroscopy; SINGLE-LAYER MOS2; PHASE-TRANSITION; MONOLAYER MOS2; FUNCTIONALIZATION; SPECTROSCOPY;

D O I：

10.1002/chem.202102021

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The development of an efficient method to patterning 2D MoS2 into a desired topographic structure is of particular importance to bridge the way towards the ultimate device. Herein, we demonstrate a patterning strategy by combining the electron beam lithography with the surface covalent functionalization. This strategy allows us to generate delicate MoS2 ribbon patterns with a minimum feature size of 2 mu m in a high throughput rate. The patterned monolayer MoS2 domain consists of a spatially well-defined heterophase homojunction and alternately distributed surface characteristics, which holds great interest for further exploration of MoS2 based devices.

引用

页码：13117 / 13122

页数：6

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