Electrodeposition of anisotropic NiFe thin films for integrated high-frequency micro-inductor

NiFe thin films were fabricated on wafer by applying 100mT external magnetic field during electroplating, and the function of in-plane parallel magnetic field in the course of the plating experiment and magnetic properties have been studied in this paper. Magnetic measurements show that in-plane anisotropy field can be abtained by magnet-electroplating, and the magnetic properties are very sensitive to the thickness of film. The Ni70Fe30 film with thickness of both 0.6 mu m and 1.2 mu m exhibit significantly uniaxial surface anisotropy and the complex permeability of the direction of parallel magnetic field can reach about 220 while 2 mu m NiFe thin film does not have a uniaxial magnetic anisotropy. The results also show that the ferromagnetic-resonance frequency(FMR) can run up to 500Mz when the thickness is suitable, which is an essential performance in the design of micro-inductor devices.