A micromachined X-ray collector for space astronomy

被引：0
|
作者：
Ezoe, Y. [1 ]
Koshiishi, M. [1 ]
Mita, M. [1 ]
Maeda, Y. [1 ]
Mitsuda, K. [1 ]
Osawa, T. [2 ]
Suzuki, M. [2 ]
Hoshino, A. [2 ]
Ishisaki, Y. [2 ]
Takano, T. [3 ]
Maeda, R. [3 ]
机构：
[1] Japan Aerosp Explorat Agcy, Inst Space & Astronaut Sci, 3-1-1 Yoshinodai, Sagamihara, Kanagawa 2298510, Japan
[2] Tokyo Metropolitan Univ, Tokyo 1920397, Japan
[3] Natl Inst Adv Ind Sci & Technol, Ibaraki 3058564, Japan
来源：
TRANSDUCERS '07 & EUROSENSORS XXI, DIGEST OF TECHNICAL PAPERS, VOLS 1 AND 2 | 2007年
关键词：
X-ray collector; silicon (111) planes; anisotropic wet etching; deep reactive ion etching;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A novel micromachined X-ray collector using anisotropically etched Si (111) planes as X-ray mirrors for future astronomical missions is reported. Mirrors, fabricated using dynashock-type ultrasonic waves, have very smooth surfaces with ail rms roughness of nm or less. After the etching, mirror chips were cut front the wafer with a dicing machine and adhered to a mount formed by deep reactive ion etching, in order to collect parallel X-ray beam (phi 100 mm) on a tiny focus (phi 4 mm). The first light image was successfully obtained at Al K-alpha 1.49 keV in a ISAS 30m-long beam line.
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页数：2
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