A micromachined X-ray collector for space astronomy

被引：0

作者：

Ezoe, Y. ^{[1
]}

Koshiishi, M. ^{[1
]}

Mita, M. ^{[1
]}

Maeda, Y. ^{[1
]}

Mitsuda, K. ^{[1
]}

Osawa, T. ^{[2
]}

Suzuki, M. ^{[2
]}

Hoshino, A. ^{[2
]}

Ishisaki, Y. ^{[2
]}

Takano, T. ^{[3
]}

Maeda, R. ^{[3
]}

机构：

[1] Japan Aerosp Explorat Agcy, Inst Space & Astronaut Sci, 3-1-1 Yoshinodai, Sagamihara, Kanagawa 2298510, Japan

[2] Tokyo Metropolitan Univ, Tokyo 1920397, Japan

[3] Natl Inst Adv Ind Sci & Technol, Ibaraki 3058564, Japan

来源：

TRANSDUCERS '07 & EUROSENSORS XXI, DIGEST OF TECHNICAL PAPERS, VOLS 1 AND 2 | 2007年

关键词：

X-ray collector; silicon (111) planes; anisotropic wet etching; deep reactive ion etching;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel micromachined X-ray collector using anisotropically etched Si (111) planes as X-ray mirrors for future astronomical missions is reported. Mirrors, fabricated using dynashock-type ultrasonic waves, have very smooth surfaces with ail rms roughness of nm or less. After the etching, mirror chips were cut front the wafer with a dicing machine and adhered to a mount formed by deep reactive ion etching, in order to collect parallel X-ray beam (phi 100 mm) on a tiny focus (phi 4 mm). The first light image was successfully obtained at Al K-alpha 1.49 keV in a ISAS 30m-long beam line.

引用

页数：2

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