Modeling and Fabrication of 4H-SiC Schottky Junction

被引:0
|
作者
Martychowiec, A. [1 ]
Pedryc, A. [1 ]
Kociubinski, A. [1 ]
机构
[1] Lublin Univ Technol, Nadbystrzycka 38d, PL-20618 Lublin, Poland
关键词
silicon carbide; SiC technology; Schottky barrier diode; Schottky junction;
D O I
10.1117/12.2280948
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The rapidly growing demand for electronic devices requires using of alternative semiconductor materials, which could replace conventional silicon. Silicon carbide has been proposed for these harsh environment applications (high temperature, high voltage, high power conditions) because of its wide bandgap, its high temperature operation ability, its excellent thermal and chemical stability, and its high breakdown electric field strength. The Schottky barrier diode (SBD) is known as one of the best refined SiC devices. This paper presents prepared model, simulations and description of technology of 4H-SiC Schottky junction as well as characterization of fabricated structures. The future aim of the application of the structures is an optical detection of an ultraviolet radiation. The model section contains a comparison of two different solutions of SBD's construction. Simulations - as a crucial process of designing electronic devices - have been performed using the ATLAS device of Silvaco TCAD software. As a final result the paper shows I-V characteristics of fabricated diodes.
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页数:7
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