Critical Layer Thickness: Theory and Experiment in the ZnSe/GaAs (001) Material System

被引:1
|
作者
Kujofsa, Tedi [1 ]
Ayers, John E. [1 ]
机构
[1] Univ Connecticut, Dept Elect & Comp Engn, 371 Fairfield Way,Unit 4157, Storrs, CT 06269 USA
来源
关键词
apparent critical layer thickness; ZnSe/GaAs; experimental resolution; X-RAY-DIFFRACTION; STRAINED-LAYER; STRUCTURAL-PROPERTIES; MISFIT DISLOCATIONS; EPITAXY; GAAS; ZNSE; HETEROSTRUCTURES; RELAXATION; EVOLUTION;
D O I
10.1142/S0129156417400201
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The critical layer thickness (CLT) determines the criteria for dislocation formation and the onset of lattice relaxation. Although several theoretical models have been developed for the critical layer thickness, experimentally-measured CLTs in ZnSe/GaAs (001) heterostructures are often at variance with one another as well as with established theories. In a previous work [T. Kujofsa et al., J. Vac. Sci. Technol. B, 34, 051201 (2016)], we showed that the experimentally measured CLT may be much larger than the equilibrium value when using finite experimental resolution. In this work, we apply a general dislocation flow model to determine the apparent critical layer thickness as a function of the experimental resolution for ZnSe/GaAs (001) heterostructures. More importantly, we compare the results utilizing different equilibrium theories and therefore varying driving forces for the lattice relaxation in order to determine which established models are consistent with several measured values of CLT for ZnSe/GaAs (001) once kinetically-limited relaxation and finite experimental strain resolution are taken into account.
引用
收藏
页码:187 / 195
页数:9
相关论文
共 50 条
  • [1] Apparent critical layer thickness in ZnSe/GaAs (001) heterostructures and the role of finite experimental resolution
    Kujofsa, Tedi
    Cheruku, Sushma
    Sidoti, David
    Xhurxhi, Sirjan
    Obst, Francis
    Correa, Juan P.
    Bertoli, Brandon
    Rago, Paul B.
    Suarez, Ernesto N.
    Jain, Faquir C.
    Ayers, John E.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2016, 34 (05):
  • [2] COMPARISON OF THEORY AND EXPERIMENT FOR LPE LAYER THICKNESS OF GAAS AND GAAS ALLOYS
    MOON, RL
    KINOSHITA, J
    JOURNAL OF CRYSTAL GROWTH, 1974, 21 (01) : 149 - 154
  • [4] Topography measurements of the critical thickness of ZnSe grown on GaAs
    Horsburgh, G
    Prior, KA
    Meredith, W
    Galbraith, I
    Cavenett, BC
    Whitehouse, CR
    Lacey, G
    Cullis, AG
    Parbrook, PJ
    Mock, P
    Mizuno, K
    APPLIED PHYSICS LETTERS, 1998, 72 (24) : 3148 - 3150
  • [5] Study of plastic relaxation of layer stress in ZnSe/GaAs(001) heterostructures
    Schreiber, J
    Hilpert, U
    Höring, L
    Worschech, L
    König, B
    Ossau, W
    Waag, A
    Landwehr, G
    MICROSCOPY OF SEMICONDUCTING MATERIALS 1999, PROCEEDINGS, 1999, (164): : 299 - 304
  • [6] Quantitative growth-investigation of zincblend ZnMgSe/GaAs(001) and ZnSe/GaAs(001) by means of RHEED, HRXRD and thickness monitoring
    Frey, T
    Reisinger, T
    Folger, B
    Kastner, M
    Gebhardt, W
    JOURNAL OF CRYSTAL GROWTH, 1998, 184 : 31 - 36
  • [7] Critical layer thickness of GaIn(N)As(Sb) QWs on GaAs and InP substrates for (001) and (111) orientations
    Koksal, K.
    Gonul, B.
    Oduncuoglu, M.
    EUROPEAN PHYSICAL JOURNAL B, 2009, 69 (02): : 211 - 218
  • [8] Critical layer thickness of GaIn(N)As(Sb) QWs on GaAs and InP substrates for (001) and (111) orientations
    K. Köksal
    B. Gönül
    M. Oduncuoğlu
    The European Physical Journal B, 2009, 69 : 211 - 218
  • [9] The use of thickness graded samples to investigate the elastic to plastic relaxation in ZnSe/GaAs(001)
    Etgens, VH
    Capelle, B
    Carbonell, L
    Eddrief, M
    APPLIED PHYSICS LETTERS, 1999, 75 (14) : 2108 - 2110
  • [10] Improvement in the quality of ZnSe epilayers grown on (001) GaAs by the low temperature growth of a thin ZnSe buffer layer
    Zhang, XB
    Ha, KL
    Hark, SK
    JOURNAL OF CRYSTAL GROWTH, 2001, 226 (01) : 13 - 18