Critical Layer Thickness: Theory and Experiment in the ZnSe/GaAs (001) Material System

被引:1
|
作者
Kujofsa, Tedi [1 ]
Ayers, John E. [1 ]
机构
[1] Univ Connecticut, Dept Elect & Comp Engn, 371 Fairfield Way,Unit 4157, Storrs, CT 06269 USA
来源
关键词
apparent critical layer thickness; ZnSe/GaAs; experimental resolution; X-RAY-DIFFRACTION; STRAINED-LAYER; STRUCTURAL-PROPERTIES; MISFIT DISLOCATIONS; EPITAXY; GAAS; ZNSE; HETEROSTRUCTURES; RELAXATION; EVOLUTION;
D O I
10.1142/S0129156417400201
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The critical layer thickness (CLT) determines the criteria for dislocation formation and the onset of lattice relaxation. Although several theoretical models have been developed for the critical layer thickness, experimentally-measured CLTs in ZnSe/GaAs (001) heterostructures are often at variance with one another as well as with established theories. In a previous work [T. Kujofsa et al., J. Vac. Sci. Technol. B, 34, 051201 (2016)], we showed that the experimentally measured CLT may be much larger than the equilibrium value when using finite experimental resolution. In this work, we apply a general dislocation flow model to determine the apparent critical layer thickness as a function of the experimental resolution for ZnSe/GaAs (001) heterostructures. More importantly, we compare the results utilizing different equilibrium theories and therefore varying driving forces for the lattice relaxation in order to determine which established models are consistent with several measured values of CLT for ZnSe/GaAs (001) once kinetically-limited relaxation and finite experimental strain resolution are taken into account.
引用
收藏
页码:187 / 195
页数:9
相关论文
共 50 条
  • [21] Critical layer thickness of GaN thin layers embedded in GaAs
    Sato, M
    SOLID-STATE ELECTRONICS, 1997, 41 (02) : 323 - 326
  • [22] Critical layer thickness of InGaAs on GaAs examined by photoreflectance spectroscopy
    Sek, G
    Misiewicz, J
    Radziewicz, D
    Tlaczala, M
    Panek, M
    Korbutowicz, R
    VACUUM, 1998, 50 (1-2) : 219 - 221
  • [23] CONTROVERSY OF CRITICAL LAYER THICKNESS FOR INGAAS/GAAS STRAINED-LAYER EPITAXY
    GOURLEY, PL
    FRITZ, IJ
    DAWSON, LR
    APPLIED PHYSICS LETTERS, 1988, 52 (05) : 377 - 379
  • [24] Critical thickness of relaxation in InGaAs/GaAs single quantum well on (001) and (111)B GaAs substrates
    Gutiérrez, M
    González, D
    Aragón, G
    Sánchez, JJ
    Izpura, I
    García, R
    BOLETIN DE LA SOCIEDAD ESPANOLA DE CERAMICA Y VIDRIO, 2000, 39 (04): : 482 - 486
  • [25] COMPARISON OF THEORY AND EXPERIMENT ON RELATIVE STABILITY IN A BISTABLE (ZNSE) SYSTEM
    HARDING, RH
    PAOLI, P
    ROSS, J
    JOURNAL OF CHEMICAL PHYSICS, 1990, 92 (03): : 1947 - 1955
  • [26] KINETICS OF FORMATION OF THE TRANSITION LAYER IN THE SYSTEM ZNSE FILM GAAS SUBSTRATE
    MURAVEVA, KK
    IVANOV, VA
    INORGANIC MATERIALS, 1978, 14 (05) : 671 - 674
  • [27] Apparent critical thickness versus temperature for InAs quantum dot growth on GaAs(001)
    Patella, F
    Arciprete, F
    Fanfoni, M
    Balzarotti, A
    Placidi, E
    APPLIED PHYSICS LETTERS, 2006, 88 (16)
  • [28] CRITICAL THICKNESS OF THIN LIQUID-FILMS - THEORY AND EXPERIMENT
    RADOEV, BP
    SCHELUDKO, AD
    MANEV, ED
    JOURNAL OF COLLOID AND INTERFACE SCIENCE, 1983, 95 (01) : 254 - 265
  • [29] Strain and critical layer thickness analysis of carbon-doped GaAs
    Kim, SI
    Kim, MS
    Min, SK
    SOLID STATE COMMUNICATIONS, 1996, 97 (10) : 875 - 878
  • [30] CRITICAL LAYER THICKNESS FOR SELF-ASSEMBLED INAS ISLANDS ON GAAS
    LEONARD, D
    POND, K
    PETROFF, PM
    PHYSICAL REVIEW B, 1994, 50 (16): : 11687 - 11692