Growth and characterization of InSb/InP short-period strained-layer superlattices grown by ALMBE

被引:3
|
作者
Utzmeier, T
Armelles, G
Postigo, PA
Briones, F
机构
[1] Inst. de Microelectronica de Madrid, C.S.I.C., 28006 Madrid
关键词
D O I
10.1016/0038-1101(95)00375-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report for the first time the successful growth of short period strained-layer superlattices of InSb/InP by atomic layer molecular beam epitaxy. This sample combination is especially interesting because the equivalent ternary alloy has a very wide miscibility gap in which it cannot be grown. The samples were characterized by reflection high-energy electron diffraction, X-ray diffraction, Hall measurements and Raman spectroscopy. The X-ray measurements show clearly satellite peaks that indicate the formation of the superlattice. Raman spectra show the confined phonon peaks of InSb (194 cm(-1)) and InP (300 cm(-1)), respectively. Exciting in resonance with the E(1) transition of the SPSL the peaks corresponding to the LO(1) and LO(2) phonons are clearly identified.
引用
收藏
页码:621 / 626
页数:6
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