REALIZATION OF SHORT-PERIOD SI/GE STRAINED-LAYER SUPERLATTICES

被引：0
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作者：
EBERL, K
WEGSCHEIDER, W
FRIESS, E
ABSTREITER, G
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来源：
HETEROSTRUCTURES ON SILICON : ONE STEP FURTHER WITH SILICON | 1989年 / 160卷
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：153 / 160
页数：8
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