Studies on dc magnetron sputtered cadmium oxide films

被引：58
|
作者：
Subramanyam, TK [1 ]
Naidu, BS [1 ]
Uthanna, S [1 ]
机构：
[1] Sri Venkateswara Univ, Dept Phys, Tirupati 517502, Andhra Pradesh, India
来源：
APPLIED SURFACE SCIENCE | 2001年 / 169卷
关键词：
thin films; cadmium oxide; magnetron sputtering; oxygen pressure; chemical composition; physical properties;
D O I：
10.1016/S0169-4332(00)00714-5
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Thin films of cadmium oxide (CdO) have been prepared by de reactive magnetron sputtering on glass substrates held at a fixed temperature of 623 K and at different oxygen partial pressures in 1 x 10(-4)-5 x 10(-3) mbar range. The deposited films were characterized by studying the dependence of oxygen partial pressure on their chemical composition, crystallographic structure, electrical and optical properties. Films with a low electrical resistivity of 8.2 x 10(-4) Ohm cm and high visible transmittance of 85% have been obtained at an oxygen partial pressure of 1 x 10(-3) mbar. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：529 / 534
页数：6
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