Structure and optical properties of dc reactive magnetron sputtered zinc oxide films

被引：1
|
作者：
Subramanyam, TK [1 ]
Naidu, BS [1 ]
Uthanna, S [1 ]
机构：
[1] Sri Venkateswara Univ, Dept Phys, Tirupati 517502, Andhra Pradesh, India
来源：
CRYSTAL RESEARCH AND TECHNOLOGY | 1999年 / 34卷 / 08期
关键词：
thin films; zinc oxide; de magnetron sputtering; structure of thin films; optical properties of thin films;
D O I：
10.1002/(SICI)1521-4079(199909)34:8<981::AID-CRAT981>3.0.CO;2-G
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
Zinc oxide films were deposited on glass substrates in argon and oxygen atmosphere by de reactive magnetron sputtering using a metallic zinc target. The influence of oxygen pressure and substrate temperature on the structure and optical properties of the films were systematically investigated and optimised the deposition parameters to prepare single phase zinc oxide films with preferred (002) orientation. At an optimum oxygen pressure of 1x10(-3) mbar and substrate temperature of 663 K; the films exhibited an optical transmittance of 83% with a band gap of 3.28 eV.
引用
收藏
页码：981 / 988
页数：8
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