Oxidation kinetics of overstoichiometric TiB2 thin films grown by DC magnetron sputtering

被引：29

作者：

Dorri, Samira ^{[1
]}

Palisaitis, Justinas ^{[1
]}

Greczynski, Grzegorz ^{[1
]}

Petrov, Ivan ^{[1
,2
,3
]}

Birch, Jens ^{[1
]}

Hultman, Lars ^{[1
]}

Bakhit, Babak ^{[1
]}

机构：

[1] Linkoping Univ, Dept Phys IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden

[2] Univ Illinois, Dept Mat Sci, Mat Res Lab, Champaign, IL 61801 USA

[3] Natl Taiwan Univ Sci & Technol, Dept Mat Sci & Engn, Taipei 10607, Taiwan

来源：

CORROSION SCIENCE | 2022年 / 206卷

基金：

瑞典研究理事会;

关键词：

Sputtering; Thin films; Titanium diboride(TiB2); Microstructure; Oxidation; HIGH-TEMPERATURE OXIDATION; MONOLITHIC TIB2; MECHANICAL-PROPERTIES; THERMAL-STABILITY; DIFFUSION BARRIER; RESISTANCE; ZRB2; ZIRCONIUM; BEHAVIOR; HARDNESS;

D O I：

10.1016/j.corsci.2022.110493

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We systematically study the oxidation properties of sputter-deposited TiB2.5 coatings up to 700 C. Oxide-scale thickness dox increases linearly with time ta for 300, 400, 500, and 700 C, while an oxidation-protective behavior occurs with dox = 250 & BULL;t0.2a at 600 C. Oxide-layer's structure changes from amorphous to rutile/ anatase-TiO2 at temperatures & GE; 500 C. Abnormally low oxidation rate at 600 C is attributed to a highly dense columnar TiO2-sublayer growing near oxide/film interface with a top-amorphous thin layer, suppressing oxygen diffusion. A model is proposed to explain the oxide-scale evolution at 600 C. Decreasing heating rate to 1.0 C/ min plays a noticeable role in the TiB2.5 oxidation.

引用

页数：20

共 50 条

[1] The influence of deposition parameters on TiB2 thin films prepared by DC magnetron sputtering
Grancic, B
Mikula, M
Hrubá, L
Gregor, M
Stefecka, M
Csuba, A
Dobrocka, E
Plecenik, A
Kús, P
VACUUM, 2005, 80 (1-3) : 174 - 177
[2] Structure, mechanical and tribological properties of dc magnetron sputtered TiB2 and TiB2(N) thin films
Deng, H
Chen, J
Inturi, RB
Barnard, JA
SURFACE & COATINGS TECHNOLOGY, 1995, 76-77 (1-3): : 609 - 614
[3] ZnxZryOz thin films grown by DC magnetron sputtering
Sanchez, O.
Hernandez-Velez, M.
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2017, 214 (10):
[4] Characterization of magnetron sputtering TiB2 and Ti-B-N thin films
张同俊
Transactions of Nonferrous Metals Society of China, 2000, (05) : 619 - 624
[5] Characterization of magnetron sputtering TiB2 and Ti-B-N thin films
Zhang, TJ
Wong, MS
Sproul, WD
Chung, YW
TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2000, 10 (05) : 619 - 624
[6] Synthesis and characterization of TiBx (1.2 ≤ x ≤ 2.8) thin films grown by DC magnetron co-sputtering from TiB2 and Ti targets
Hellgren, Niklas
Sredenschek, Alexander
Petruins, Andrejs
Palisaitis, Justinas
Klimashin, Fedor F.
Sortica, Maurico A.
Hultman, Lars
Persson, Per O. A.
Rosen, Johanna
SURFACE & COATINGS TECHNOLOGY, 2022, 433
[7] Effect of Target Current on the Structure and Properties of TiB2 Thin Films Prepared by Magnetron Sputtering
Leng, Xiao
Li, Hongxuan
Ji, Li
Zhang, Dingjun
CHINA SURFACE ENGINEERING, 2024, 37 (05) : 147 - 157
[8] Effect of aluminium ion implantation on the oxidation resistance of DC magnetron sputter-deposited TiB2 thin films
Mollica, S
Sood, DK
Evans, PJ
Noorman, JT
Dytlewski, N
Brack, N
Pigram, P
Latham, K
SURFACE & COATINGS TECHNOLOGY, 2004, 177 : 185 - 197
[9] Synthesis and characterization of CrB 2 thin films grown by DC magnetron sputtering
Dorri, Megan M.
Thornberg, Jimmy
Hellgren, Niklas
Palisaitis, Justinas
Petruhins, Andrejs
Klimashin, Fedor F.
Hultman, Lars
Petrov, Ivan
Persson, Per O. A.
Rosen, Johanna
SCRIPTA MATERIALIA, 2021, 200
[10] Mechanical properties of superhard TiB2 coatings prepared by DC magnetron sputtering
Mikula, Marian
Grancic, Branislav
Bursikova, Vilma
Csuba, Adrian
Drzik, Milan
Kavecky, Stefan
Plecenik, Andrej
Kus, Peter
VACUUM, 2007, 82 (02) : 278 - 281

← 1 2 3 4 5 →