The influence of deposition parameters on TiB2 thin films prepared by DC magnetron sputtering

被引：17
|
作者：
Grancic, B
Mikula, M
Hrubá, L
Gregor, M
Stefecka, M
Csuba, A
Dobrocka, E
Plecenik, A
Kús, P
机构：
[1] Comenius Univ, Dept Expt Phys, FMPI, Bratislava, Slovakia
[2] Inst Mat & Machine Mech, Bratislava, Slovakia
[3] Slovak Univ Technol Bratislava, Dept Mfg Syst, FME, Bratislava, Slovakia
[4] Slovak Inst Metrol, Bratislava, Slovakia
来源：
VACUUM | 2005年 / 80卷 / 1-3期
关键词：
titanium diboride; magnetron sputtering; hard coatings; buffer layer;
D O I：
10.1016/j.vacuum.2005.08.013
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
TiB2 coatings were deposited on silicon and steel substrates by DC magnetron sputtering from a stoichiometric target in an Ar inert atmosphere. The dependence of coating morphology and structure on Ar pressure was investigated. The properties of the coatings were examined by AES, AFM, XRD and SEM. The coating morphology and preferential orientation were pressure dependent. Coatings acquired a microhardness of more than 50GPa. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码：174 / 177
页数：4
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