Oxidation kinetics of overstoichiometric TiB2 thin films grown by DC magnetron sputtering

被引：29

作者：

Dorri, Samira ^{[1
]}

Palisaitis, Justinas ^{[1
]}

Greczynski, Grzegorz ^{[1
]}

Petrov, Ivan ^{[1
,2
,3
]}

Birch, Jens ^{[1
]}

Hultman, Lars ^{[1
]}

Bakhit, Babak ^{[1
]}

机构：

[1] Linkoping Univ, Dept Phys IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden

[2] Univ Illinois, Dept Mat Sci, Mat Res Lab, Champaign, IL 61801 USA

[3] Natl Taiwan Univ Sci & Technol, Dept Mat Sci & Engn, Taipei 10607, Taiwan

来源：

CORROSION SCIENCE | 2022年 / 206卷

基金：

瑞典研究理事会;

关键词：

Sputtering; Thin films; Titanium diboride(TiB2); Microstructure; Oxidation; HIGH-TEMPERATURE OXIDATION; MONOLITHIC TIB2; MECHANICAL-PROPERTIES; THERMAL-STABILITY; DIFFUSION BARRIER; RESISTANCE; ZRB2; ZIRCONIUM; BEHAVIOR; HARDNESS;

D O I：

10.1016/j.corsci.2022.110493

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We systematically study the oxidation properties of sputter-deposited TiB2.5 coatings up to 700 C. Oxide-scale thickness dox increases linearly with time ta for 300, 400, 500, and 700 C, while an oxidation-protective behavior occurs with dox = 250 & BULL;t0.2a at 600 C. Oxide-layer's structure changes from amorphous to rutile/ anatase-TiO2 at temperatures & GE; 500 C. Abnormally low oxidation rate at 600 C is attributed to a highly dense columnar TiO2-sublayer growing near oxide/film interface with a top-amorphous thin layer, suppressing oxygen diffusion. A model is proposed to explain the oxide-scale evolution at 600 C. Decreasing heating rate to 1.0 C/ min plays a noticeable role in the TiB2.5 oxidation.

引用

页数：20

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