Demonstration of 20 nm half-pitch spatial resolution with soft x-ray microscopy

被引:12
|
作者
Chao, W [1 ]
Anderson, EH
Denbeaux, G
Harteneck, B
Pearson, AL
Olynick, D
Salmassi, F
Song, C
Attwood, D
机构
[1] Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA
[3] Lawrence Berkeley Natl Lab, Natl Ctr Electron Microscopy, Berkeley, CA 94720 USA
来源
关键词
D O I
10.1116/1.1619956
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The full field, transmission soft x-ray microscope XM-1 is a valuable imaging instrument for many scientific and technological areas involving nanometer features. Operating from 300 to 1800 eV, it combines high spatial resolution, elemental discrimination, magnetic sensitivity, and a capability of imaging in various experimental conditions, such as with applied magnetic fields and electric currents. In this article, we report experiments that enable accurate spatial resolution measurement, using a new type of test pattern, made from thinned multilayer coatings. The resolution of the microscope was measured to be 20 nm, using this method. (C) 2003 American Vacuum Society.
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收藏
页码:3108 / 3111
页数:4
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