Demonstration of 20 nm half-pitch spatial resolution with soft x-ray microscopy

被引：12

作者：

Chao, W ^{[1
]}

Anderson, EH

Denbeaux, G

Harteneck, B

Pearson, AL

Olynick, D

Salmassi, F

Song, C

Attwood, D

机构：

[1] Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA

[3] Lawrence Berkeley Natl Lab, Natl Ctr Electron Microscopy, Berkeley, CA 94720 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 06期

关键词：

D O I：

10.1116/1.1619956

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The full field, transmission soft x-ray microscope XM-1 is a valuable imaging instrument for many scientific and technological areas involving nanometer features. Operating from 300 to 1800 eV, it combines high spatial resolution, elemental discrimination, magnetic sensitivity, and a capability of imaging in various experimental conditions, such as with applied magnetic fields and electric currents. In this article, we report experiments that enable accurate spatial resolution measurement, using a new type of test pattern, made from thinned multilayer coatings. The resolution of the microscope was measured to be 20 nm, using this method. (C) 2003 American Vacuum Society.

引用

页码：3108 / 3111

页数：4

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