PLASMA-ENHANCED ATOMIC LAYER DEPOSITION OF Al2O3 THIN FILM ON TIO2 NANOTUBES

被引：0
|
作者：
Goncalves, Rachel C. [1 ]
Doria, Anelise C. O. C. [1 ]
Lima, Jhonatan. S. B. [1 ]
Pessoa, Rodrigo S. [1 ]
Maciel, Homero S. [1 ]
机构：
[1] Univ Vale Paraiba, Lab Nanotechnol & Plasmas Proc, Av Shishima Hifumi, BR-12244000 Sao Jose Dos Campos, SP, Brazil
来源：
2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS) | 2017年
基金：
巴西圣保罗研究基金会;
关键词：
D O I：
暂无
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
引用
收藏
页数：1
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