Xenon doping of glow discharge polymer by ion implantation

被引：3
|
作者：
Shin, Swanee J. [1 ]
Kucheyev, Sergei O. [1 ]
Orme, Christine A. [1 ]
Youngblood, Kelly P. [2 ]
Nikroo, Abbas [2 ]
Moreno, Kari A. [2 ]
Chen, Bryan [2 ]
Hamza, Alex V. [1 ]
机构：
[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
[2] Gen Atom Co, San Diego, CA 92186 USA
来源：
JOURNAL OF APPLIED PHYSICS | 2012年 / 111卷 / 09期
关键词：
AMORPHOUS-CARBON; FABRICATION; DIFFUSION; HYDROGEN; SPECTRA; MANDREL; FILMS;
D O I：
10.1063/1.4707949
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We demonstrate controlled doping of a glow discharge polymer by implantation with 500 keV Xe ions at room temperature. The Xe retention exhibits a threshold behavior, with a threshold dose of similar to 2 x 10(14) cm(-2). Doping is accompanied by irradiation-induced changes in the polymer composition, including gradual H loss and a more complex non-monotonic behavior of the O concentration. The matrix composition saturates at C0.77H0.22O0.01 for Xe doses above similar to 5 x 10(14) cm(-2) and up to the maximum dose studied (5 x 10(15) cm(-2)). The retention mechanism is attributed to the modification of the polymer from a chain-like to clustered ring structure. The dopant profile and the elemental composition of the implanted polymer exhibit good stability upon thermal annealing up to 305 degrees C. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4707949]
引用
收藏
页数：3
相关论文
共 50 条
  • [1] DOPING AND HYDROGENATION BY ION-IMPLANTATION OF GLOW-DISCHARGE DEPOSITED AMORPHOUS-SILICON FILMS
    GALLONI, R
    TSUO, YS
    BAKER, DW
    ZIGNANI, F
    APPLIED PHYSICS LETTERS, 1990, 56 (03) : 241 - 243
  • [2] Experimental investigation of discharge characteristics in enhanced glow discharge plasma immersion ion implantation
    Lu, Qiu Yuan
    Li, Liu He
    Fu, Ricky K. Y.
    Chu, Paul K.
    PHYSICS LETTERS A, 2008, 372 (40) : 6183 - 6186
  • [3] Hybrid evaporation: Glow discharge source for plasma immersion ion implantation
    Li, LH
    Poon, RWY
    Kwok, SCH
    Chu, RK
    Wu, YQ
    Zhang, YH
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2003, 74 (10): : 4301 - 4304
  • [4] Study of gas heating in a xenon glow discharge
    Benmoussa, A.
    Si-Sabeur, H.
    Harrache, Z.
    Belasri, A.
    PLASMA DEVICES AND OPERATIONS, 2007, 15 (04): : 299 - 304
  • [5] Influence of annular magnet on discharge characteristics in enhanced glow discharge plasma immersion ion implantation
    Li, Liu He
    Wang, Zhuo
    Lu, Qiu Yuan
    Pang, En Jing
    Dun, Dan Dan
    He, Fu Shun
    Li, Fen
    Fu, Ricky K. Y.
    Chu, Paul K.
    APPLIED PHYSICS LETTERS, 2011, 98 (02)
  • [6] Transformation of Enhanced Glow Discharge Dynamics in Nitrogen Plasma Immersion Ion Implantation
    Lu, Qiuyuan
    Li, Liuhe
    Li, Penghui
    Xu, Ruizhen
    Fu, Ricky King-Yu
    Chu, Paul K.
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2013, 41 (03) : 553 - 558
  • [7] Low energy ion implantation using non-equilibrium glow discharge
    Radovanov, Svetlana
    Godet, Ludovic
    FIRST INTERNATIONAL WORKSHOP ON NONEQUILIBRIUM PROCESSES IN PLASMA PHYSICS AND STUDIES OF ENVIRONMENT, 2007, 71
  • [8] Plasma immersion ion implantation based on glow discharge with electrostatic confinement of electrons
    Metel, A
    SURFACE & COATINGS TECHNOLOGY, 2002, 156 (1-3): : 38 - 43
  • [9] Evaporation-glow discharge hybrid source for plasma immersion ion implantation
    Li, LH
    Fu, RKY
    Poon, RWY
    Kwok, SCH
    Chu, PK
    Wu, YQ
    Zhang, YH
    Cai, X
    Chen, QL
    Xu, M
    SURFACE & COATINGS TECHNOLOGY, 2004, 186 (1-2): : 165 - 169
  • [10] Ion focusing in enhanced glow discharge plasma immersion ion implantation of hydrogen and nitrogen into silicon
    Lu, Qiu Yuan
    Wang, Zhuo
    Li, Liu He
    Fu, Ricky K. Y.
    Chu, Paul. K.
    JOURNAL OF APPLIED PHYSICS, 2010, 108 (03)
12345