Influence of annular magnet on discharge characteristics in enhanced glow discharge plasma immersion ion implantation

被引：7

作者：

Li, Liu He ^{[1
,2
]}

Wang, Zhuo ^{[1
,2
]}

Lu, Qiu Yuan ^{[1
]}

Pang, En Jing ^{[2
]}

Dun, Dan Dan ^{[2
]}

He, Fu Shun ^{[2
]}

Li, Fen ^{[2
]}

Fu, Ricky K. Y. ^{[1
]}

Chu, Paul K. ^{[1
]}

机构：

[1] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China

[2] Beijing Univ Aeronaut & Astronaut, Dept 702, Sch Mech & Automat Engn, Beijing 100083, Peoples R China

来源：

APPLIED PHYSICS LETTERS | 2011年 / 98卷 / 02期

基金：

美国国家科学基金会;

关键词：

HOLLOW-ANODE DISCHARGE; FIELD;

D O I：

10.1063/1.3537962

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A permanent annular magnet positioned at the grounded anode alters the discharge characteristics in enhanced glow discharge plasma immersion ion implantation (EGD-PIII). The nonuniform magnetic field increases the electron path length and confines electron motion due to the magnetic mirror effect and electron-neutral collisions thus occur more frequently. The plasma potential and ion density measured by a Langmuir probe corroborate that ionization is improved near the grounded anode. This hybrid magnetic field EGD-PIII method is suitable for implantation of gases with low ionization rates. (C) 2011 American Institute of Physics. [doi:10.1063/1.3537962]

引用

页数：3

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