A simple method for determination of Fowler-Nordheim tunnelling parameters

被引:2
|
作者
Casados-Cruz, G. [1 ]
Reyes-Barranca, M. A. [1 ]
Moreno-Cadenas, J. A. [1 ]
机构
[1] Ctr Invest & Estudios Avanzados IPN, Dept Elect Engn, Ciudad De Mexico 07360, Mexico
关键词
analogue circuits; CAD; semiconductors; measurements; integrated circuits; Fowler-Nordheim tunnelling; MEMORY CELL MODEL; EEPROM CELLS; SIMULATION;
D O I
10.1080/00207217.2010.520148
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A simple technique for extracting the Fowler-Nordheim (FN) tunnelling parameters is proposed. It consists of measuring the Drain-Source current of a floating gate transistor while a linear ramp voltage is applied to a simple injector structure attached to the transistor's floating gate. Such a test device is fabricated using a standard CMOS process. The parameters obtained can be used in a freely available electrical simulator as SPICE3f5 (NGSPICE), but in general it can be easily adapted to other SPICE-like programs. We describe the technique step-by-step and a comparison is made of simulated and measured FN tunnelling parameters, for a floating gate transistor with tunnelling injectors. A good agreement has been found between experimental and simulated data.
引用
收藏
页码:655 / 666
页数:12
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