Extraction of band diagram parameters from Fowler-Nordheim model in silicon dioxide

被引:2
|
作者
Sorbier, JP
Plossu, C
Croci, S
Boivin, P
Renard, S
Harrabech, N
Bouchakour, R
机构
[1] Inst Charles FABRY, IMT, Lab Mat & Microelect Provence, F-13451 Marseille 20, France
[2] Inst Natl Sci Appl, UMR CNRS 5511, Phys Mat Lab, F-69621 Villeurbanne, France
[3] STMicroelectronics, F-13106 Rousset, France
[4] Ecole Natl Super Telecommun, Dept COMELEC, F-75634 Paris 13, France
关键词
D O I
10.1016/S0022-3093(00)00359-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In electric fields > 10(7) V/cm, we have observed that the conduction current through Si(n(+))/SiO2/poly-Si(n(+)) capacitors is larger than that predicted by the classical Fowler-Nordheim law for the case of a triangular potential barrier. This phenomenon appears for both gate polarities just before electric breakdown occurs. An attempt to model this excess current by direct tunneling or by other well-known conduction mechanisms such as Schottky, Poole-Frenkel or hopping effects has been unsuccessful. We have succeeded in interpreting experimental data by considering the SiO2 layer as a non-triangular potential barrier, which leads to a non-linear relationship between the tunneling length and the applied voltage. By using a semi-linear approach, an oxide conduction band model presenting two potential wells located at approximately from 2.5 nm to within +/- 0.2 nm from each oxide interface has been obtained. These two singularities may be related to the presence of a non-uniformly distributed positive charge in SiO2. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:96 / 102
页数:7
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