Extraction of band diagram parameters from Fowler-Nordheim model in silicon dioxide

被引:2
|
作者
Sorbier, JP
Plossu, C
Croci, S
Boivin, P
Renard, S
Harrabech, N
Bouchakour, R
机构
[1] Inst Charles FABRY, IMT, Lab Mat & Microelect Provence, F-13451 Marseille 20, France
[2] Inst Natl Sci Appl, UMR CNRS 5511, Phys Mat Lab, F-69621 Villeurbanne, France
[3] STMicroelectronics, F-13106 Rousset, France
[4] Ecole Natl Super Telecommun, Dept COMELEC, F-75634 Paris 13, France
关键词
D O I
10.1016/S0022-3093(00)00359-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In electric fields > 10(7) V/cm, we have observed that the conduction current through Si(n(+))/SiO2/poly-Si(n(+)) capacitors is larger than that predicted by the classical Fowler-Nordheim law for the case of a triangular potential barrier. This phenomenon appears for both gate polarities just before electric breakdown occurs. An attempt to model this excess current by direct tunneling or by other well-known conduction mechanisms such as Schottky, Poole-Frenkel or hopping effects has been unsuccessful. We have succeeded in interpreting experimental data by considering the SiO2 layer as a non-triangular potential barrier, which leads to a non-linear relationship between the tunneling length and the applied voltage. By using a semi-linear approach, an oxide conduction band model presenting two potential wells located at approximately from 2.5 nm to within +/- 0.2 nm from each oxide interface has been obtained. These two singularities may be related to the presence of a non-uniformly distributed positive charge in SiO2. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:96 / 102
页数:7
相关论文
共 50 条
  • [21] Impact of stress on Fowler-Nordheim parameters effects on EEPROM threshold voltage
    Postel-Pellerin, J.
    Lalande, F.
    Canet, P.
    Boutahar, S.
    Bouchakour, R.
    Pizzuto, O.
    Regnier, A.
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2007, 353 (5-7) : 610 - 614
  • [22] A model for effective field enhancement for Fowler-Nordheim field emission
    Feng, Y
    Verboncoeur, JP
    [J]. PHYSICS OF PLASMAS, 2005, 12 (10) : 1 - 6
  • [23] Update on analysis of Fowler-Nordheim plots from nonmetallic emitters
    Forbes, RG
    [J]. IVMC 2000: PROCEEDINGS OF THE 14TH INTERNATIONAL VACUUM MICROELECTRONICES CONFERENCE, 2001, : 95 - 95
  • [24] HYDROGENATION OF BORON ACCEPTOR IN SILICON DURING ELECTRON INJECTION BY FOWLER-NORDHEIM TUNNELING
    CHAO, CYP
    LUO, MSC
    PAN, SCS
    SAH, CT
    [J]. APPLIED PHYSICS LETTERS, 1987, 50 (04) : 180 - 181
  • [25] Metal gate work function extraction using Fowler-Nordheim tunneling techniques
    Sjöblom, G
    Pantisano, L
    Schram, T
    Olsson, J
    Afanas'ev, VV
    Heyns, M
    [J]. MICROELECTRONIC ENGINEERING, 2005, 80 : 280 - 283
  • [26] Negative bias temperature instability and Fowler-Nordheim injection in silicon oxynitride insulators
    Busani, T.
    Devine, R. A. B.
    Hughes, H. L.
    [J]. APPLIED PHYSICS LETTERS, 2007, 90 (16)
  • [27] Effects of moisture on Fowler-Nordheim characterization of thin silicon-oxide films
    Peterson, CA
    Workman, RK
    Sarid, D
    Vermeire, B
    Parks, HG
    Adderton, D
    Maivald, P
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1999, 17 (05): : 2753 - 2758
  • [28] Beyond Fowler-Nordheim model: harmonic generation from metallic nano-structures
    Yusofsani, S.
    Kolesik, M.
    [J]. EUROPEAN PHYSICAL JOURNAL-SPECIAL TOPICS, 2021, 230 (23): : 4071 - 4079
  • [29] A universal semiempirical model for the Fowler-Nordheim programming of charge trapping devices
    Sundararaman, Ravishankar
    Tiwari, Sandip
    [J]. APPLIED PHYSICS LETTERS, 2010, 96 (02)
  • [30] Effects of gate material on Fowler-Nordheim stress induced thin silicon dioxide degradation under negative gate bias
    Samanta, P
    Chan, MS
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 96 (03) : 1547 - 1555