Structural investigations of sputtered thin films with X-ray absorption techniques

被引：0

作者：

Lutzenkirchen-Hecht, D ^{[1
]}

Kramer, A ^{[1
]}

Hammer, H ^{[1
]}

Frahm, R ^{[1
]}

机构：

[1] Univ Dusseldorf, Inst Angew Phys, D-40225 Dusseldorf, Germany

来源：

TRENDS AND NEW APPLICATIONS OF THIN FILMS | 1998年 / 287-2卷

关键词：

EXAFS; sputter deposition; Ag; NbN; atomic short range order;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The extended X-ray absorption fine structure technique (EXAFS) in the reflection mode was used for ex situ investigation of sputter deposited thin films on float glass substrates. We show that a detailed analysis of the reflectivity fine structure data enables the extraction of short range order structural information such as bond distances, coordination numbers and Debye-Waller-factors. The results obtained from the evaluation of the reflectivity data will be compared to those obtained from transmission EXAFS data of the bulk reference materials.

引用

页码：357 / 360

页数：4

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