A Closed Form Analytical Model of Back-Gated 2-D Semiconductor Negative Capacitance Field Effect Transistors

被引:35
|
作者
Jiang, Chunsheng [1 ,2 ]
Si, Mengwei [2 ]
Liang, Renrong [1 ]
Xu, Jun [1 ]
Ye, Peide D. [2 ]
Alam, Muhammad Ashraful [2 ]
机构
[1] Tsinghua Univ, Inst Microelect, Tsinghua Natl Lab Informat Sci & Technol, Beijing 100084, Peoples R China
[2] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
来源
基金
中国国家自然科学基金;
关键词
Negative capacitance; two-dimensional materials; analytical model; low-power application;
D O I
10.1109/JEDS.2017.2787137
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Steep slope (SS < 60 mV/dec at room temperature) negative capacitance (NC) FETs, based on the 2-D transition metal dichalcogenide semiconductor channel materials, may have a promising future in low-power electronics because of their high on-state current and very high on/off ratio. In this paper, we develop an analytically compact drain current model for long-channel back-gated 2-D NC-FETs by solving the classical drift-diffusion equations. The equations describe the transition from depletion to accumulation regimes of operation as a continuous function of gate/drain voltages. The continuity ensures time-efficient simulation of large systems. Several key features of the model are verified by comparing with the experimental data. Specifically, the negative drain induced barrier lowering effect and negative differential resistance effect predicted by the model are successfully observed in our experiments.
引用
收藏
页码:189 / 194
页数:6
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