Effects of parasitic capacitance on both static and dynamic electrical characteristics of back-gated two-dimensional semiconductor negative-capacitance field-effect transistors

被引:4
|
作者
Jiang, Chunsheng [1 ]
Liang, Renrong [2 ]
Zhong, Le [1 ]
Xie, Lei [1 ,3 ]
Cheng, Weijun [2 ]
Xu, Jun [2 ]
机构
[1] China Acad Engn Phys, Microsyst & Terahertz Res Ctr, Chengdu 610200, Sichuan, Peoples R China
[2] Tsinghua Univ, Inst Microelect, Tsinghua Natl Lab Informat Sci & Technol, Beijing 100084, Peoples R China
[3] China Acad Engn Phys, Inst Elect Engn, Mianyang 621999, Peoples R China
基金
中国国家自然科学基金;
关键词
MOS2; TRANSISTORS; MODEL;
D O I
10.7567/APEX.11.124101
中图分类号
O59 [应用物理学];
学科分类号
摘要
Negative-capacitance field-effect transistors (NC-FETs) are a promising candidate for future low-power Internet of Things (IoT) applications. In this work, a unified analytical drain-current model for back-gated two-dimensional (2D) NC-FETs has been proposed for both static and dynamic simulations, and this model is calibrated to experimental data. Effects of parasitic capacitance on both the static and dynamic electrical characteristics of back-gated 2D NC-FETs are investigated systematically on the basis of the model. It is found that parasitic capacitance contributes to the reduction in subthreshold swing but leads to a larger dynamic hysteresis. Thus, a balance between both should be carefully taken into account. (C) 2018 The Japan Society of Applied Physics
引用
收藏
页数:5
相关论文
共 50 条
  • [1] Gate capacitance of back-gated nanowire field-effect transistors
    Wunnicke, Olaf
    [J]. APPLIED PHYSICS LETTERS, 2006, 89 (08)
  • [2] Current Prospects and Challenges in Negative-Capacitance Field-Effect Transistors
    Islam, Md. Sherajul
    Mazumder, Abdullah Al Mamun
    Zhou, Changjian
    Stampfl, Catherine
    Park, Jeongwon
    Yang, Cary Y. Y.
    [J]. IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2023, 11 : 235 - 247
  • [3] A Closed Form Analytical Model of Back-Gated 2-D Semiconductor Negative Capacitance Field Effect Transistors
    Jiang, Chunsheng
    Si, Mengwei
    Liang, Renrong
    Xu, Jun
    Ye, Peide D.
    Alam, Muhammad Ashraful
    [J]. IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2018, 6 (01): : 189 - 194
  • [4] Environmental Effects on the Electrical Characteristics of Back-Gated WSe2 Field-Effect Transistors
    Urban, Francesca
    Martucciello, Nadia
    Peters, Lisanne
    McEvoy, Niall
    Di Bartolomeo, Antonio
    [J]. NANOMATERIALS, 2018, 8 (11)
  • [5] Temperature effect on electrical characteristics of negative capacitance ferroelectric field-effect transistors
    Xiao, Y. G.
    Tang, M. H.
    Li, J. C.
    Cheng, C. P.
    Jiang, B.
    Cai, H. Q.
    Tang, Z. H.
    Lv, X. S.
    Gu, X. C.
    [J]. APPLIED PHYSICS LETTERS, 2012, 100 (08)
  • [6] Al back-gated graphene field-effect transistors for capacitive sensing applications based on quantum capacitance effect
    Ju, Wonbin
    Lee, Sungbae
    [J]. AIP ADVANCES, 2022, 12 (09)
  • [7] Device Simulation of Negative-Capacitance Field-Effect Transistors With a Ferroelectric Gate Insulator
    Hattori, Junichi
    Ikegami, Tsutomu
    Fukuda, Koichi
    Ota, Hiroyuki
    Migita, Shinji
    Asai, Hidehiro
    [J]. 2018 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES (SISPAD 2018), 2018, : 214 - 219
  • [8] Short-Channel Effects in 2D Negative-Capacitance Field-Effect Transistors
    You, Wei-Xiang
    Tsai, Chih-Peng
    Su, Pin
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (04) : 1604 - 1610
  • [9] Carrier statistics and quantum capacitance effects on mobility extraction in two-dimensional crystal semiconductor field-effect transistors
    Ma, Nan
    Jena, Debdeep
    [J]. 2D MATERIALS, 2015, 2 (01):
  • [10] Hybrid Design Using Metal-Oxide-Semiconductor Field-Effect Transistors and Negative-Capacitance Field-Effect Transistors for Analog Circuit Applications
    Han, Kaizhen
    Sun, Chen
    Yu, Eugene
    Kong, Jin
    Wu, Ying
    Heng, Chun-Huat
    Gong, Xiao
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2021, 68 (02) : 846 - 852