Contact resistance and trap density of oligoaniline field-effect transistor

被引:3
|
作者
Weng, SZ [1 ]
Kuo, CT [1 ]
Wu, SL [1 ]
机构
[1] Tatung Univ, Dept Chem Engn, Taipei 104, Taiwan
来源
JOURNAL OF POLYMER RESEARCH-TAIWAN | 2003年 / 10卷 / 03期
关键词
contact resistance; MOSFET; oligoaniline; trap density;
D O I
10.1023/A:1026056329995
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The characteristics of metal-oxide-semiconductor field-effect transistors (MOSFETs) fabricated with 16-mer oligoaniline (16ANI) as semiconducting layer have been investigated. It is found that the contact resistance can be reduced three orders of magnitude by modifying the interface between metal electrode and organic material. Hence the field-effect mobility of modified 16ANI MOSFET can be increased by four times. The mobility can be further improved in the subsequent thermal treatment process. It is found that the field-effect mobility rather depends on trap density than on contact resistance.
引用
收藏
页码:211 / 217
页数:7
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