Atomic Force Microscope base nanolithography for reproducible micro and nanofabrication

被引：0

作者：

Dehzangi, Arash ^{[1
]}

Larki, Farhad ^{[1
]}

Majlis, Burhanuddin Y. ^{[1
]}

Kazemi, Zainab ^{[1
]}

Ariannejad, MohammadMahdi ^{[1
]}

Nasery, Mahmood Goodarz ^{[2
]}

Navasery, Manizheh ^{[2
]}

Saion, Elias B. ^{[2
]}

Mohamed, Halimah K. ^{[2
]}

Khalilzadeh, Nasrin ^{[2
]}

Abdullah, A. Makarimi ^{[3
]}

Hutagalung, Sabar D. ^{[4
]}

机构：

[1] Univ Kebangsaan Malaysia, Inst Microengn & Nanoelect IMEN, Bangi 43600, Selangor, Malaysia

[2] Univ Putra Malaysia, Dept Phys, Serdang 43400, Selangor, Malaysia

[3] Univ Kuala Lumpur, Malaysian Inst Marine Engn Technol, Kuala Lumpur, Malaysia

[4] Jazan Univ, Dept Phys, Fac Sci, Jazan, Saudi Arabia

来源：

2014 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS (ICSE) | 2014年

关键词：

Local anodic oxidation; Silicon-on-insulator; Nanolithography; Atomic force microscope; DOUBLE-GATE; SILICON; FABRICATION; LITHOGRAPHY; TRANSISTOR; OXIDATION; DEVICES; CHARGE;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on ptype (10(15) cm(-3)) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.

引用

页码：408 / 411

页数：4

共 50 条

[11] An atomic force microscope nanoscalpel for nanolithography and biological applications
Beard, J. D.
Burbridge, D. J.
Moskalenko, A. V.
Dudko, O.
Yarova, P. L.
Smirnov, S. V.
Gordeev, S. N.
[J]. NANOTECHNOLOGY, 2009, 20 (44)
[12] Nanolithography and manipulation of graphene using an atomic force microscope
Giesbers, A. J. M.
Zeitler, U.
Neubeck, S.
Freitag, F.
Novoselov, K. S.
Maan, J. C.
[J]. SOLID STATE COMMUNICATIONS, 2008, 147 (9-10) : 366 - 369
[13] Atomic force microscope local oxidation nanolithography of graphene
Weng, Lishan
Zhang, Liyuan
Chen, Yong P.
Rokhinson, L. P.
[J]. APPLIED PHYSICS LETTERS, 2008, 93 (09)
[14] Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment
Lu, Xiaofeng
Balocco, Claudio
Yang, Fuhua
Song, Aimin M.
[J]. IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2011, 10 (01) : 53 - 58
[15] Atomic force microscope integrated with a scanning electron microscope for correlative nanofabrication and microscopy
Rangelow, Ivo W.
Kaestner, Marcus
Ivanov, Tzvetan
Ahmad, Ahmad
Lenk, Steve
Lenk, Claudia
Guliyev, Elshad
Reum, Alexander
Hofmann, Martin
Reuter, Christoph
Holz, Mathias
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2018, 36 (06):
[16] Dynamic plowing nanolithography on polymethylmethacrylate using an atomic force microscope
Heyde, M
Rademann, K
Cappella, B
Geuss, M
Sturm, H
Spangenberg, T
Niehus, H
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 2001, 72 (01): : 136 - 141
[17] A method for simulating Atomic Force Microscope nanolithography in the Level Set framework
Filipovic, Lado
Selberherr, Siegfried
[J]. MICROELECTRONIC ENGINEERING, 2013, 107 : 23 - 32
[18] Atomic force microscope transformed into instrument for dip-pen nanolithography
不详
[J]. MRS BULLETIN, 1999, 24 (04) : 8 - 8
[19] Atomic force microscope nanolithography on SiO2/semiconductor surfaces
Avramescu, A
Uesugi, K
Suemune, I
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (6B): : 4057 - 4060
[20] NANOLITHOGRAPHY WITH AN ATOMIC-FORCE MICROSCOPE FOR INTEGRATED FABRICATION OF QUANTUM ELECTRONIC DEVICES
WENDEL, M
KUHN, S
LORENZ, H
KOTTHAUS, JP
HOLLAND, M
[J]. APPLIED PHYSICS LETTERS, 1994, 65 (14) : 1775 - 1777

← 1 2 3 4 5 →