SCHOTKY BARRIER HEIGHT AND CALCULATION OF VOLTAGE-CURRENT CHARACTERISTICS OF Al/n-(SIC)1-x(ALN)x DIODES AND 4H-SIC HETEROJUNCTIONS

被引:0
|
作者
Altukhov, V., I [1 ]
Sankin, A., V [1 ]
Antonov, V. F. [1 ]
Filipova, S., V [1 ]
Mityugova, A. [1 ]
机构
[1] North Caucasus Fed Univ, Branch Pyatigorsk, Pyatigorsk, Russia
关键词
Schottky barrier; SiC solid solutions; I-V characteristics of diodes; composite model; emission currents;
D O I
10.1007/s11182-020-01889-9
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The Schottky barrier heights in the M/n-(SiC)(1-x)(AlN)(x) systems are obtained on the assumption of a high density of surface states in the region of the metal (M) - SiC-AlN-solid solution contact. Current-voltage (I-V) characteristics of the Al/n-(SiC)(1-x)(AlN)(x) diodes are calculated. It is shown that at moderate concentrations of surface states (c approximate to 4-8), the Schottky barrier height Phi(x)(B)(C) of these diodes is close to the heterojunction potential barrier Phi(x)(g), which is the reason for the known similarity in the behavior of the corresponding I-V characteristics. The role of the ideality factors in the behavior of the I-V characteristics is analyzed. The obtained values of the Schottky barrier heights are in accordance with experimental data.
引用
收藏
页码:1663 / 1667
页数:5
相关论文
共 50 条
  • [21] Gaussian distribution of inhomogeneous barrier height in tungsten/4H-SiC (000-1) Schottky diodes
    Toumi, S.
    Ferhat-Hamida, A.
    Boussouar, L.
    Sellai, A.
    Ouennoughi, Z.
    Ryssel, H.
    MICROELECTRONIC ENGINEERING, 2009, 86 (03) : 303 - 309
  • [22] Analysis of Trapping Effects on the Forward Current-Voltage Characteristics of Al-Implanted 4H-SiC p-i-n Diodes
    Megherbi, M. Larbi
    Pezzimenti, Fortunato
    Dehimi, Lakhdar
    Saadoune, M. Achour
    Della Corte, Francesco G.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (08) : 3371 - 3378
  • [23] Temperature dependent current-voltage characteristics of microwave annealed Al+ implanted 4H-SiC p+-i-n diodes
    Nath, A.
    Rao, Mulpuri V.
    Moscatelli, F.
    Puzzanghera, M.
    Mancarella, F.
    Nipoti, R.
    2014 20TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY (IIT 2014), 2014,
  • [24] Current-Voltage Characteristics of High-Voltage 4H-SiC p+-n0-n+ Diodes in the Avalanche Breakdown Mode
    Ivanov, P. A.
    Potapov, A. S.
    Samsonova, T. P.
    Grekhov, I. V.
    SEMICONDUCTORS, 2017, 51 (03) : 374 - 378
  • [25] Isothermal current-voltage characteristics of high-voltage 4H-SiC junction barrier Schottky rectifiers
    Levinshtein, M. E.
    Ivanov, P. A.
    Zhang, Q. J.
    Palmour, J. W.
    SEMICONDUCTORS, 2016, 50 (05) : 656 - 661
  • [26] Comparison of electrical characteristics of 4H-SiC(0001) and (000-1) Schottky barrier diodes
    Nakamura, T.
    Miyanagi, T.
    Kamata, I.
    Tsuchida, H.
    SILICON CARBIDE AND RELATED MATERIALS 2005, PTS 1 AND 2, 2006, 527-529 : 927 - +
  • [27] Exploration of switching characteristics of 4H-SiC floating junction Schottky barrier diodes with stronger blocking voltage capability
    Nan, Yagong
    Han, Genquan
    JOURNAL OF POWER ELECTRONICS, 2021, 21 (10) : 1567 - 1573
  • [28] Exploration of switching characteristics of 4H-SiC floating junction Schottky barrier diodes with stronger blocking voltage capability
    Yagong Nan
    Genquan Han
    Journal of Power Electronics, 2021, 21 : 1567 - 1573
  • [29] Current–voltage characteristics of high-voltage 4H-SiC p+–n0–n+ diodes in the avalanche breakdown mode
    P. A. Ivanov
    A. S. Potapov
    T. P. Samsonova
    I. V. Grekhov
    Semiconductors, 2017, 51 : 374 - 378
  • [30] Computational model for the formation of (SiC)1-x(AlN)x structures by hot, high-dose N+ and Al+ co-implants in 6H-SiC
    Truschin, Yu.V.
    Yankov, R.A.
    Kharlamov, V.S.
    Kulikov, D.V.
    Tsigankov, D.N.
    Kreissig, U.
    Voelskow, M.
    Pezoldt, J.
    Skorupa, W.
    Materials Science Forum, 1998, 264-268 (pt 2): : 757 - 760