First boronization in KSTAR

被引：14

作者：

Hong, S. H. ^{[1
,3
]}

Lee, K. S. ^{[1
]}

Kim, K. M. ^{[1
]}

Kim, H. T. ^{[1
]}

Kim, G. P. ^{[1
]}

Sun, J. H. ^{[2
,3
]}

Woo, H. J. ^{[2
,3
]}

Park, J. M. ^{[1
]}

Kim, W. C. ^{[1
]}

Kim, H. K. ^{[1
]}

Park, K. R. ^{[1
]}

Yang, H. L. ^{[1
]}

Na, H. K. ^{[1
]}

Chung, K. S. ^{[2
,3
]}

机构：

[1] Natl Fus Res Inst, Taejon 305333, South Korea

[2] Hanyang Univ, Dept Elect Engn, Seoul 133791, South Korea

[3] Hanyang Univ, Ctr Edge Plasma Sci, Seoul 133791, South Korea

来源：

FUSION ENGINEERING AND DESIGN | 2010年 / 85卷 / 06期

关键词：

Wall conditioning; Boronization; a-C/B:H thin film; Carborane; KSTAR; CARBORANE; JT-60U; WALL;

D O I：

10.1016/j.fusengdes.2010.04.064

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

First boronization in KSTAR is reported. KSTAR boronization system is based on a carborane (C(2)B(10)H(12)) injection system. The design, construction, and test of the system are accomplished and it is tested by using a small vacuum vessel before it is mounted to a KSTAR port. After the boronization in KSTAR, impurity levels are significantly reduced by factor of 3 (oxygen) and by 10 (carbon). Characteristics of a-C/B:H thin films deposited by carborane vapor are investigated. Re-condensation of carborane vapor during the test phase has been reported. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：946 / 949

页数：4

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