TOWARDS MEASUREMENT SENSITIVITY IMPROVEMENT IN SPECKLE INTERFEROMETRY

被引：1
|
作者：
Shtanko, A. E. [1 ]
Ivanova, S. D. [1 ]
Shemonaev, D. D. [2 ]
机构：
[1] Moscow State Univ Technol STANKIN, Moscow, Russia
[2] Natl Res Nucl Univ MEPhI, Moscow, Russia
来源：
RUSSIAN PHYSICS JOURNAL | 2022年 / 65卷 / 01期
关键词：
speckle interferometer; speckle interferogram; visualization; sensitivity; vibrations; laser emission;
D O I：
10.1007/s11182-022-02622-4
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
[No abstract available]
引用
收藏
页码：193 / 196
页数：4
相关论文
共 50 条
  • [41] Dynamic phase measurement of large deformation with speckle interferometry
    Matsumoto, T
    Kitagawa, Y
    Adachi, M
    OPTOMECHATRONIC SYSTEMS III, 2002, 4902 : 571 - 575
  • [42] APPLICATIONS OF LASER SPECKLE INTERFEROMETRY TO STRAIN CONCENTRATION MEASUREMENT
    CHIANG, FP
    ADACHI, J
    ANASTASI, R
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1976, 66 (02) : 183 - 183
  • [43] Electronic speckle interferometry for the deformation measurement in masonry testing
    Binda, L
    Facchini, M
    Roberti, GM
    Tiraboschi, C
    CONSTRUCTION AND BUILDING MATERIALS, 1998, 12 (05) : 269 - 281
  • [44] ELECTRONIC SPECKLE PATTERN INTERFEROMETRY MEASUREMENT OF RESIDUAL STRESS
    Sedivy, Otomar
    Krempaszky, Christian
    Holy, Stanislav
    25TH DANUBIA-ADRIA SYMPOSIUM ON ADVANCES IN EXPERIMENTAL MECHANICS, 2008, : 229 - 230
  • [45] TILT MEASUREMENT USING DIGITAL SPECKLE SHEAR INTERFEROMETRY
    SIROHI, RS
    GANESAN, AR
    TAN, BC
    OPTICS AND LASER TECHNOLOGY, 1992, 24 (05): : 257 - 261
  • [46] Improvement of measurement sensitivity near contact in intensity-interferometry flying height testers
    Korakoch Phetdee
    Alongkorn Pimpin
    Werayut Srituravanich
    Microsystem Technologies, 2015, 21 : 49 - 53
  • [47] Improvement of measurement sensitivity near contact in intensity-interferometry flying height testers
    Phetdee, Korakoch
    Pimpin, Alongkorn
    Srituravanich, Werayut
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2015, 21 (01): : 49 - 53
  • [48] IMPROVEMENT OF SPECKLE STATISTICS IN DOUBLE-WAVELENGTH SUPERHETERODYNE INTERFEROMETRY
    DANDLIKER, R
    GEISER, M
    GIUNTI, C
    ZATTI, S
    MARGHERI, G
    APPLIED OPTICS, 1995, 34 (31): : 7197 - 7201
  • [49] INCREASED SENSITIVITY TO INPLANE DISPLACEMENTS IN ELECTRONIC SPECKLE PATTERN INTERFEROMETRY
    JOENATHAN, C
    SOHMER, A
    BURKLE, L
    APPLIED OPTICS, 1995, 34 (16): : 2880 - 2885
  • [50] Expansion of measurement area of three-dimensional deformation measurement speckle interferometry with same sensitivities in three directions under consideration of measurement sensitivity
    Arai, Y.
    APPLIED OPTICAL METROLOGY II, 2017, 10373
12345