Dielectric and electrical properties of annealed ZnS thin films. The appearance of the OLPT conduction mechanism in chalcogenides

被引:34
|
作者
Koaib, J. [1 ]
Noureddine, B. [1 ]
Henda, A. [2 ]
Moutia, N. [1 ]
Mabrouk, K. [1 ]
Timoumi, A. [3 ,4 ]
Vazquez-Vazquez, C. [5 ]
Khirouni, K. [1 ]
Alaya, S. [1 ]
机构
[1] Univ Gabes, Fac Sci, Lab Phys Mat & Nanomat Appl Environm, Zrig 6072, Gabes, Tunisia
[2] Univ Tunis El Manar, Fac Sci Tunis, Lab Caracterisat Applicat & Modelisat Mat, Campus Univ, Tunis 1068, Tunisia
[3] Natl Engn Sch Tunis, Photovolta & Semicond Mat Lab, Belvedere POB 37, Tunis 1002, Tunisia
[4] Umm Al Qura Univ, Fac Appl Sci, Dept Phys, Thin Film & Solar Cells Lab, Mecca 21955, Saudi Arabia
[5] Univ Santiago de Compostela, Fac Chem, Dept Phys Chem, Lab Magnetism & Nanotechnol NANOMAG, Santiago De Compostela 15782, Spain
关键词
OPTICAL-PROPERTIES; FREQUENCY; TEMPERATURE; TRANSITION; BEHAVIOR;
D O I
10.1039/c9ra10284a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The annealing temperature (T-a) dependence of the structural, morphological, electrical and dielectric properties of ZnS thin films was investigated. In this work, we consider the as-deposited and annealed ZnS thin films at different temperatures. The as-deposited films were amorphous in nature. However, the films annealed at T-a >= 673 K, exhibited a hexagonal structure with (002) preferential orientation. The post annealing caused an improvement in crystallinity. The best one was observed at T-a = 723 K. Grain size increased from 7 nm to 25 nm as annealing temperature was increased from 673 K to 723 K. The surface of annealed samples is homogenous and uniform and the rms roughness is dependent on the annealing temperature: it increases with temperature within the range 5-50 nm. The film electrical conductance is found to be dependent on frequency measurement and annealing temperature: the dc conductance exhibits semi-conductor behavior for all ZnS films over the explored range of temperature and the conductance was found to enhance with increasing annealing temperature up to 623 K. In addition, it was observed that the highest conductance and lowest activation energy of ZnS films were obtained at an annealing temperature of 623 K. The mechanism of alternating current ac conductance can be reasonably explained in terms of the overlapping-large polaron tunnelling (OLPT) model for samples annealed at 623 K and 673 K. To our knowledge, this conduction mechanism was rarely found in chalcogenide materials. A significant change of Nyquist plot with annealing temperature was noted permitting the correlation between the microstructure and its electrical properties. The impedance analysis investigated that the relaxation process is well pronounced for the both annealed films at 623 K and 673 K. The dielectric behavior was associated to the polarization effect, an improvement on the dielectric constant epsilon ' and dielectric loss epsilon '' with annealing was noticed.
引用
收藏
页码:9549 / 9562
页数:14
相关论文
共 50 条
  • [21] EFFECT OF ANNEALING ON ELECTRICAL PROPERTIES OF THIN CdSe FILMS.
    Jakubowski, A.
    Electron Technology (Warsaw), 1975, 8 (3-4): : 59 - 66
  • [22] INVESTIGATION INTO THE STRUCTURE AND ELECTRICAL PROPERTIES OF THIN MOLYBDENUM FILMS.
    Protsenko, I.E.
    Yaremenko, A.V.
    Physics of Metals (English Translation of Metallofizika), 1983, 4 (02): : 326 - 332
  • [23] ELECTRICAL TRANSPORT PROPERTIES OF TUNGSTEN SILICIDE THIN FILMS.
    Li, B.Z.
    Aitken, R.G.
    Applied Physics Letters, 1985, 46 (04) : 401 - 403
  • [24] Enhanced dielectric and electrical properties of annealed PVDF thin film
    Arshad, A. N.
    Rozana, M. D.
    Wahid, M. H. M.
    Mahmood, M. K. A.
    Sarip, M. N.
    Habibah, Z.
    Rusop, M.
    8TH INTERNATIONAL CONFERENCE ON NANOSCIENCE AND NANOTECHNOLOGY 2017 (NANO-SCITECH 2017), 2018, 1963
  • [25] ELECTRICAL-CONDUCTION MECHANISM IN THIN CORONENE FILMS
    SWIATEK, J
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1976, 38 (01): : 285 - 291
  • [26] Electrical conduction mechanism in high-dielectric-constant ZrO2 thin films
    Wang, MT
    Wang, TH
    Lee, JYM
    MICROELECTRONICS RELIABILITY, 2005, 45 (5-6) : 969 - 972
  • [27] Dielectric spectroscopic investigations and electrical conduction mechanism of PVDF-NiO nanocomposite thin films
    Kaur, Gurpreet
    Rana, Dinesh Singh
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2021, 32 (04) : 4713 - 4726
  • [28] ELECTRICAL-CONDUCTION IN THIN METALLIC, DIELECTRIC AND METALLIC-DIELECTRIC FILMS
    CAMPBELL, DS
    MORLEY, AR
    REPORTS ON PROGRESS IN PHYSICS, 1971, 34 (04) : 283 - +
  • [29] Electrical and structural properties of annealed ZnO:B thin films
    Wang, Yanfeng
    Huang, Haiyan
    Meng, Xudong
    Yang, Fu
    Nan, Jingyu
    Song, Qinggong
    Huang, Qian
    Zhao, Ying
    Zhang, Xiaodan
    Journal of Alloys and Compounds, 2015, 636 : 102 - 105
  • [30] Electrical properties of annealed a-SiC:H thin films
    Magafas, L.
    Bandekas, D.
    Boglou, A. K.
    Anagnostopoloulos, A. N.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2007, 353 (11-12) : 1065 - 1069