Modelisation of Ni-P electroless deposition in ammoniacal solutions

被引：38
|
作者：
Touhami, ME
Chassaing, E
Cherkaoui, M
机构：
[1] CNRS, Ctr Etud Chim Met, F-94407 Vitry Sur Seine, France
[2] Univ Ibn Tofail, Fac Sci, Lab Electrochem & Surface Treatments, Kenitra, Morocco
来源：
ELECTROCHIMICA ACTA | 2003年 / 48卷 / 24期
关键词：
Ni-P layers; kinetics of electroless plating; impedance spectroscopy modelisation; electroless deposition mechanism; modelisation of electroless deposition;
D O I：
10.1016/S0013-4686(03)00486-9
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A reaction path for the electroless deposition of Ni-P layers is developed. The steady-state polarisation and impedance responses are calculated. The comparison between the experimental results and the calculation shows the adequacy of the model. The mechanism accounts for most of the experimental features observed for the steady-state and the impedance behaviours and their dependencies with pH, hypophosphite and nickel sulphate concentrations. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码：3651 / 3658
页数：8
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