Effects of phosphorus content on the reaction of electroless Ni-P with Sn and crystallization of Ni-P

被引:25
|
作者
Sohn, YC [1 ]
Yu, J
Kang, SK
Shih, DY
Choi, WK
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[2] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
[3] Samsung Adv Inst Technol, Mat & Device Lab, Suwon 440600, South Korea
关键词
electroless Ni-O; Sn; reaction; P;
D O I
10.1007/s11664-004-0243-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The reaction between electroless Ni-P and Sn and the crystallization behavior of Ni-P were investigated to better understand the effect of P content on the Ni-P layer. Electroless Ni-P specimens with three different P contents, 4.6 wt.%, 9 wt.%, and 13 wt.%, were used to study the effect of the P content and the microstructure of Ni-P on the subsequent crystallization and intermetallic compound (IMC) formation during the reaction between Ni-P and electroplated Sn. Ni3Sn4 was the major phase formed in all samples heated up to 300degreesC, which totally transformed into Ni3Sn2 when samples were heated up to 450degreesC and the Sn layer was 0.5-mum thick. The IMC formed on the nanocrystalline Ni-P showed stronger texture compared to that formed on the amorphous Ni-P Both the IMC thickness and density decreased with P content in the Ni-P layer, and Ni3Sn4 morphologies varied with P content. Dissolution of Ni into Sn increased with P content, which made IMC size in the bulk Sn increase with P content.
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页码:790 / 795
页数:6
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