Atomic Layer of ZnO Deposition on Ag Nanowires for Novel Electrical Applications

被引：0
|
作者：
Zhang, Shuye [1 ]
Liu, Xu [1 ]
Lin, Tiesong [1 ]
He, Peng [1 ]
机构：
[1] Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150001, Peoples R China
来源：
2019 IEEE 19TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO 2019) | 2019年
基金：
中国国家自然科学基金; 中国博士后科学基金;
关键词：
Atomic layer deposition; ZnO; Ag nanowires; Transparent Electrodes; LIGHT-EMITTING-DIODES; ORGANIC SOLAR-CELLS; CONDUCTIVE FILMS; HIGHLY TRANSPARENT; ELECTRODE; NETWORKS; UNIFORMITY; STABILITY;
D O I：
10.1109/nano46743.2019.8993956
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Transparent electrode is the key component of optoelectronic devices. Nowadays, indium tin oxide (ITO) has been widely used for transparent electrode. However, Ag nanowires (NWs) are a good alternative candidate to replace the conventional ITO. In order to improve the stability of silver nanowires electrode, ZnO with nanometer size thickness is deposited on the surface of silver nanowires electrode by atomic layer deposition (ALD) method which is a method of depositing material on a substrate layer by layer in the form of a single atomic film. As the surface of the nanowires are coated with ZnO, the overall morphology is good without fusing phenomenon. The thermal stability of the silver nanowires electrode can be significantly enhanced by depositing 50 nm thickness ZnO layer including the sheet resistances.
引用
收藏
页码：507 / 511
页数：5
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