Atomic Layer of ZnO Deposition on Ag Nanowires for Novel Electrical Applications

Transparent electrode is the key component of optoelectronic devices. Nowadays, indium tin oxide (ITO) has been widely used for transparent electrode. However, Ag nanowires (NWs) are a good alternative candidate to replace the conventional ITO. In order to improve the stability of silver nanowires electrode, ZnO with nanometer size thickness is deposited on the surface of silver nanowires electrode by atomic layer deposition (ALD) method which is a method of depositing material on a substrate layer by layer in the form of a single atomic film. As the surface of the nanowires are coated with ZnO, the overall morphology is good without fusing phenomenon. The thermal stability of the silver nanowires electrode can be significantly enhanced by depositing 50 nm thickness ZnO layer including the sheet resistances.