An Efficient Simulation System for Inclined UV Lithography Processes of Thick SU-8 Photoresists

被引：8

作者：

Zhou, Zaifa ^{[1
]}

Hang, Qingan ^{[1
]}

Zhu, Zhen ^{[1
]}

Li, Weihua ^{[1
]}

机构：

[1] Southeast Univ, Key Lab MEMS, Minist Educ, Nanjing 210096, Peoples R China

来源：

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 2011年 / 24卷 / 02期

关键词：

Inclined lithography; light intensity distribution; lithography simulation; microelectromechanical systems (MEMS); SU-8; photoresist; CELLULAR-AUTOMATA; ETCHING PROCESS; EXPOSURE; FABRICATION; ALGORITHMS; PROFILE; MODELS;

D O I：

10.1109/TSM.2011.2105511

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A 2-D simulation system based on a 2-D dynamic cellular automata method, integrating aerial image simulation, exposure simulation, post-exposure bake simulation, and development simulation modules is presented for inclined ultraviolet (UV) lithography processes of thick photoresists such as SU-8 photoresists. To verify the simulation system, a series of experiments have been performed for SU-8 2000 series photoresists under UV source with 365 nm (2.6 mW/cm(2)) radiation. The simulation results demonstrate to be in agreement with the experimental results. This is useful to optimize the inclined UV lithography processes of SU-8 photoresists, and to accurately design and control the dimensions of some SU-8 microstructures.

引用

页码：294 / 303

页数：10

共 50 条

[31] Structural Comparison of SU-8 Microtubes fabricated by Direct Laser Writing and UV Lithography
Mishra, Richa
Maiti, Tapas Kumar
Bhattacharyya, Tarun Kanti
2017 IEEE SENSORS, 2017, : 217 - 219
[32] A novel fabrication method of embedded micro-channels by using SU-8 thick-film photoresists
Chuang, YJ
Tseng, FG
Cheng, JH
Lin, WK
SENSORS AND ACTUATORS A-PHYSICAL, 2003, 103 (1-2) : 64 - 69
[33] Thick silicon membranes as mask blank for SU-8 X-ray deep lithography
Maia, IA
Ferreira, LOS
Piazzetta, MHO
Natal, GC
EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 : 497 - 506
[34] Process optimization of optical lithography of SU-8 photoresist
Zhang, Ye
Chen, Di
Zhang, Jinya
Zhu, Jun
Liu, Jingquan
Zhongguo Jixie Gongcheng/China Mechanical Engineering, 2005, 16 (SUPPL.): : 437 - 440
[35] Development of novel SU-8 based nanoimprint lithography
Xie, Shen-Qi
Lu, Bing-Rui
Wan, Jing
Yang, Rong
Chen, Yifang
Qu, Xin-Ping
Liu, Ran
2008 9TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1-4, 2008, : 2468 - +
[36] Integrated vertical screen microfilter system using inclined SU-8 structures
Yoon, YK
Park, JH
Cros, F
Allen, MG
MEMS-03: IEEE THE SIXTEENTH ANNUAL INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, 2003, : 227 - 230
[37] Microfabrication of a color filter array utilizing colored SU-8 photoresists
Jiang, Linan
Kim, Kyung-Jo
Reininger, Francis M.
Jiguet, Sebastien
Pau, Stanley
APPLIED OPTICS, 2020, 59 (22) : G137 - G145
[38] A novel and simple fabrication method of embedded SU-8 micro channels by direct UV lithography
Fu, C.
Hung, C.
Huang, H.
INTERNATIONAL MEMS CONFERENCE 2006, 2006, 34 : 330 - 335
[39] Characterization of SU-8 as a resist for electron beam lithography
Nallani, AK
Park, SW
Lee, JB
SMART SENSORS, ACTUATORS, AND MEMS, PTS 1 AND 2, 2003, 5116 : 414 - 423
[40] Study on the postbaking process and the effects on UV lithography of high aspect ratio SU-8 microstructures
Williams, JD
Wang, WJ
JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (04): : 563 - 568

← 1 2 3 4 5 →