Silicon interband transitions observed at Si(100)-SiO2 interfaces

被引:55
|
作者
Erley, G [1 ]
Daum, W [1 ]
机构
[1] Forschungszentrum Julich, Inst Grenzflachenforsch & Vakuumphys, D-52425 Julich, Germany
关键词
D O I
10.1103/PhysRevB.58.R1734
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on a type of Si interband transitions at Si(100)-SiO2 interfaces that has no equivalent in the bulk of crystalline silicon. These transitions, leading to strong resonances in optical second-harmonic-generation spectra with energies of 3.6-3.8 eV, are energetically located between the E-1 and E-2 critical points of bulk Si. We assign these transitions to Si atoms without T-d lattice symmetry at the boundary between crystalline Si and the SiOx transition region. We also report on a strong blueshift of the E-2 transitions at the interface.
引用
下载
收藏
页码:R1734 / R1737
页数:4
相关论文
共 50 条
  • [31] Influence of interfaces on crystal growth of Si in SiO2/a-Si/SiO2 layered structures
    Tagami, Takashi
    Wakayama, Yutaka
    Tanaka, Shun-ichiro
    Japanese Journal of Applied Physics, Part 2: Letters, 1997, 36 (06):
  • [32] Cycling endurance of silicon-oxide-nitride-oxide-silicon nonvolatile memory stacks prepared with nitrided SiO2/Si(100) interfaces
    Habermehl, S
    Nasby, RD
    Rightley, MJ
    APPLIED PHYSICS LETTERS, 1999, 75 (08) : 1122 - 1124
  • [33] Interface state energy distribution and Pb defects at Si(110)/SiO2 interfaces: Comparison to (111) and (100) silicon orientations
    Thoan, N. H.
    Keunen, K.
    Afanas'ev, V. V.
    Stesmans, A.
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (01)
  • [34] Optical transitions from SiO2/crystalline Si/SiO2 quantum wells
    Cho, EC
    Reece, P
    Green, MA
    Corkish, R
    Gal, M
    COMMAD 2002 PROCEEDINGS, 2002, : 271 - 274
  • [35] Examination of the Si(111)-SiO2, Si(110)-SiO2, and Si(100)-SiO2 interfacial properties following rapid thermal annealing
    Hurley, PK
    O'Sullivan, BJ
    Cubaynes, FN
    Stolk, PA
    Widdershoven, FP
    Das, JH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (03) : G194 - G197
  • [36] Structural transition layer at SiO2/Si interfaces
    Hirose, K
    Nohira, H
    Koike, T
    Sakano, K
    Hattori, T
    PHYSICAL REVIEW B, 1999, 59 (08): : 5617 - 5621
  • [37] Photoelectron spectroscopy studies of SiO2/Si interfaces
    Hirose, K.
    Nohira, H.
    Azuma, K.
    Hattori, T.
    PROGRESS IN SURFACE SCIENCE, 2007, 82 (01) : 3 - 54
  • [38] Electronic structures of SiO2/Si(001) interfaces
    Yamasaki, T
    Kaneta, C
    Uchiyama, T
    Uda, T
    Terakura, K
    PHYSICS AND CHEMISTRY OF SIO2 AND THE SI-SIO2 INTERFACE - 4, 2000, 2000 (02): : 295 - 305
  • [39] Segregation of phosphorus to SiO2/Si(001) interfaces
    Dabrowski, J
    Müssig, HJ
    Baierle, R
    Caldas, MJ
    Zavodinsky, V
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2000, 3 (1-2) : 85 - 89
  • [40] ELECTRON ATTENUATION LENGTHS AT SIO2/SI INTERFACES
    YARMOFF, JA
    JOYCE, SA
    CARTIER, E
    MCFEELY, FR
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1990, 52 : 221 - 227