Silicon interband transitions observed at Si(100)-SiO2 interfaces

被引:55
|
作者
Erley, G [1 ]
Daum, W [1 ]
机构
[1] Forschungszentrum Julich, Inst Grenzflachenforsch & Vakuumphys, D-52425 Julich, Germany
关键词
D O I
10.1103/PhysRevB.58.R1734
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on a type of Si interband transitions at Si(100)-SiO2 interfaces that has no equivalent in the bulk of crystalline silicon. These transitions, leading to strong resonances in optical second-harmonic-generation spectra with energies of 3.6-3.8 eV, are energetically located between the E-1 and E-2 critical points of bulk Si. We assign these transitions to Si atoms without T-d lattice symmetry at the boundary between crystalline Si and the SiOx transition region. We also report on a strong blueshift of the E-2 transitions at the interface.
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页码:R1734 / R1737
页数:4
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