Effect Of Deposition Parameters On The Properties Of PbS/CdS Thin Film Using SILAR Method

被引:1
|
作者
John, Smiya [1 ]
Geetha, V [2 ]
机构
[1] Govt Victoria Coll, Palakkad, India
[2] Govt Arts & Sci Coll, Pathiripala, India
关键词
D O I
10.1063/1.5130348
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work Lead sulphide (PbS) and Cadmium Sulphide (CdS) thin films were grown on glass substrate by chemical bath deposition (CBD) and Successive Ionic layer adsorption and reaction technique (SILAR) techniques. The structural, morphological, chemical and optical properties of the CBD deposited thin films both PbS and CdS have been studied by varying the parameters such as concentration, pH and the deposition time. Similarly in SILAR method parameters such as concentration of cationic and ionic precursors, number of immersion cycles, wet time, dip time and pH of the solution were varied and characterization studies were done. The films were characterized by X-ray diffraction, scanning electron microscope (SEM), (energy dispersive X-rays) EDX and optical absorption measurements. SEM images confirmed that the substrates were well covered with the deposited layers without cracks or pinholes. Crystal size were found using X-ray diffraction. Optical characterization and energy gap was found using UV spectrophotometer.
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页数:8
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